Inventor
SAKAKIBARA HIROKAZU
JP27 patents
⚠️ This page may combine multiple inventors who share the name “SAKAKIBARA HIROKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
17 patentsUS7781142B2Aug 24, 2010
Copolymer and top coating composition
JSR CORP26 citations91
US8815493B2Aug 26, 2014
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP4 citations72
US8980539B2Mar 17, 2015
Developer
JSR CORP2 citations62
US9170488B2Oct 27, 2015
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP2 citations61
US8993223B2Mar 31, 2015
Resist pattern-forming method
JSR CORP2 citations61
US9417522B2Aug 16, 2016
Photosensitive resin composition and method for producing resist pattern
JSR CORP2 citations52
US10025188B2Jul 17, 2018
Resist pattern-forming method
JSR CORP0 citations51
US9335630B2May 10, 2016
Pattern-forming method, and radiation-sensitive composition
JSR CORP1 citations51
US9034559B2May 19, 2015
Pattern-forming method, and radiation-sensitive composition
JSR CORP0 citations51
US8822140B2Sep 2, 2014
Resist pattern-forming method
JSR CORP0 citations51
US8795954B2Aug 5, 2014
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP1 citations51
US12158700B2Dec 3, 2024
Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus
JSR CORP0 citations50
US11249398B2Feb 15, 2022
Method for producing plated shaped structure and photosensitive resin composition for production of plated shaped structures
JSR CORP0 citations50
US10095110B2Oct 9, 2018
Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern
JSR CORP0 citations43
US9229323B2Jan 5, 2016
Pattern-forming method
JSR CORP0 citations40
US9223207B2Dec 29, 2015
Resist pattern-forming method, and radiation-sensitive resin composition
JSR CORP0 citations40
US9164387B2Oct 20, 2015
Pattern-forming method, and radiation-sensitive resin composition
JSR CORP0 citations40
SAKAKIBARA HIROKAZU
4 patentsUS8697331B2Apr 15, 2014
Compound, polymer, and radiation-sensitive composition
SAKAKIBARA HIROKAZU2 citations59
US8715901B2May 6, 2014
Resin composition for forming fine pattern and method for forming fine pattern
SAKAKIBARA HIROKAZU1 citations50
US8530146B2Sep 10, 2013
Method for forming resist pattern
SAKAKIBARA HIROKAZU1 citations49
US8722306B2May 13, 2014
Radiation-sensitive resin composition
SAKAKIBARA HIROKAZU0 citations39