Inventor
JACOB GEORGE C
US29 patents
⚠️ This page may combine multiple inventors who share the name “JACOB GEORGE C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
28 patentsUS9484212B1Nov 1, 2016
Chemical mechanical polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC12 citations84
US9586304B2Mar 7, 2017
Controlled-expansion CMP PAD casting method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC7 citations83
US10391606B2Aug 27, 2019
Chemical mechanical polishing pads for improved removal rate and planarization
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC10 citations82
US10569384B1Feb 25, 2020
Chemical mechanical polishing pad and polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC3 citations71
US10464188B1Nov 5, 2019
Chemical mechanical polishing pad and polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations71
US10293456B2May 21, 2019
Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC3 citations71
US9475168B2Oct 25, 2016
Polishing pad window
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC5 citations71
US10259099B2Apr 16, 2019
Tapering method for poromeric polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC4 citations70
US10106662B2Oct 23, 2018
Thermoplastic poromeric polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC3 citations70
US9925637B2Mar 27, 2018
Tapered poromeric polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC6 citations70
US9630293B2Apr 25, 2017
Chemical mechanical polishing pad composite polishing layer formulation
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations70
US10464187B2Nov 5, 2019
High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations60
US11285577B2Mar 29, 2022
Thin film fluoropolymer composite CMP polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations59
US11638978B2May 2, 2023
Low-debris fluopolymer composite CMP polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations58
US9452507B2Sep 27, 2016
Controlled-viscosity CMP casting method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations52
US11491605B2Nov 8, 2022
Fluopolymer composite CMP polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations48
US11524390B2Dec 13, 2022
Methods of making chemical mechanical polishing layers having improved uniformity
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations47
US10086494B2Oct 2, 2018
High planarization efficiency chemical mechanical polishing pads and methods of making
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations47
US9481070B2Nov 1, 2016
High-stability polyurethane polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations41
US10207388B2Feb 19, 2019
Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations40
US10144115B2Dec 4, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10105825B2Oct 23, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10092998B2Oct 9, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10011002B2Jul 3, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10005172B2Jun 26, 2018
Controlled-porosity method for forming polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9776300B2Oct 3, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9586305B2Mar 7, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10722999B2Jul 28, 2020
High removal rate chemical mechanical polishing pads and methods of making
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36