Inventor
TRAN TONY QUAN
US13 patents
⚠️ This page may combine multiple inventors who share the name “TRAN TONY QUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
12 patentsUS9630293B2Apr 25, 2017
Chemical mechanical polishing pad composite polishing layer formulation
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC2 citations70
US11591495B2Feb 28, 2023
Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations61
US10995238B2May 4, 2021
Neutral to alkaline chemical mechanical polishing compositions and methods for tungsten
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations61
US10092998B2Oct 9, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10011002B2Jul 3, 2018
Method of making composite polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9776300B2Oct 3, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9586305B2Mar 7, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10861702B2Dec 8, 2020
Controlled residence CMP polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36
US10857647B2Dec 8, 2020
High-rate CMP polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36
US10857648B2Dec 8, 2020
Trapezoidal CMP groove pattern
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36
US10777418B2Sep 15, 2020
Biased pulse CMP groove pattern
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36
US10586708B2Mar 10, 2020
Uniform CMP polishing method
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations36