Inventor
YEH FENGJI
US13 patents
⚠️ This page may combine multiple inventors who share the name “YEH FENGJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ROHM & HAAS ELECT MAT
8 patentsUS9259820B2Feb 16, 2016
Chemical mechanical polishing pad with polishing layer and window
ROHM & HAAS ELECT MAT36 citations92
US8980749B1Mar 17, 2015
Method for chemical mechanical polishing silicon wafers
ROHM & HAAS ELECT MAT24 citations90
US9064806B1Jun 23, 2015
Soft and conditionable chemical mechanical polishing pad with window
ROHM & HAAS ELECT MAT13 citations82
US9102034B2Aug 11, 2015
Method of chemical mechanical polishing a substrate
ROHM & HAAS ELECT MAT8 citations81
US9144880B2Sep 29, 2015
Soft and conditionable chemical mechanical polishing pad
ROHM & HAAS ELECT MAT4 citations72
US9238295B2Jan 19, 2016
Soft and conditionable chemical mechanical window polishing pad
ROHM & HAAS ELECT MAT2 citations60
US9238296B2Jan 19, 2016
Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layer
ROHM & HAAS ELECT MAT2 citations60
US9233451B2Jan 12, 2016
Soft and conditionable chemical mechanical polishing pad stack
ROHM & HAAS ELECT MAT1 citations50
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC
5 patentsUS10144115B2Dec 4, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10105825B2Oct 23, 2018
Method of making polishing layer for chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9776300B2Oct 3, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US9586305B2Mar 7, 2017
Chemical mechanical polishing pad and method of making same
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations39
US10875144B2Dec 29, 2020
Chemical mechanical polishing pad
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations34