P

Inventor

CHANG CHONG-KWANG

KR18 patents
⚠️ This page may combine multiple inventors who share the name “CHANG CHONG-KWANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

15 patents
US9865736B2Jan 9, 2018

Semiconductor devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD7 citations82
US10276570B2Apr 30, 2019

Semiconductor device

SAMSUNG ELECTRONICS CO LTD1 citations73
US10224204B1Mar 5, 2019

Method of manufacturing integrated circuit device

SAMSUNG ELECTRONICS CO LTD3 citations71
US11670657B2Jun 6, 2023

Image sensor including fence structure disposed laterally of color filters

SAMSUNG ELECTRONICS CO LTD0 citations61
US7816271B2Oct 19, 2010

Methods for forming contacts for dual stress liner CMOS semiconductor devices

SAMSUNG ELECTRONICS CO LTD6 citations61
US12074031B2Aug 27, 2024

Method of fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations60
US11024509B2Jun 1, 2021

Method of fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD1 citations60
US8357576B2Jan 22, 2013

Method of manufacturing semiconductor device

SAMSUNG ELECTRONICS CO LTD3 citations56
US9941281B2Apr 10, 2018

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations52
US9553089B2Jan 24, 2017

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations52
US7541290B2Jun 2, 2009

Methods of forming mask patterns on semiconductor wafers that compensate for nonuniform center-to-edge etch rates during photolithographic processing

SAMSUNG ELECTRONICS CO LTD1 citations48
US8349126B2Jan 8, 2013

Apparatus for etching edge of wafer

SAMSUNG ELECTRONICS CO LTD1 citations45
US7790622B2Sep 7, 2010

Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processes

SAMSUNG ELECTRONICS CO LTD0 citations41
US7541234B2Jun 2, 2009

Methods of fabricating integrated circuit transistors by simultaneously removing a photoresist layer and a carbon-containing layer on different active areas

SAMSUNG ELECTRONICS CO LTD0 citations41
US7585763B2Sep 8, 2009

Methods of fabricating integrated circuit devices using anti-reflective coating as implant blocking layer

SAMSUNG ELECTRONICS CO LTD0 citations39

SHIN DONG SUK

1 patent

ZHUANG HAOREN

1 patent

CHANG CHONG-KWANG

1 patent