Inventor

KUMAGAI MAKI

JP2 patents

Patents

2 patents

US9857685B2Jan 2, 2018

Photosensitive resin composition, resist laminate, cured product of photosensitive resin composition, and cured product of resist laminate (11)

NIPPON KAYAKU KK2 citations67

US10782612B2Sep 22, 2020

Polysulfone amide compound, and resin composition containing same

NIPPON KAYAKU KK0 citations38