Inventor
BERNHARD DAVID
US16 patents
⚠️ This page may combine multiple inventors who share the name “BERNHARD DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED TECH MATERIALS
11 patentsUS6896826B2May 24, 2005
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS74 citations97
US6773873B2Aug 10, 2004
pH buffered compositions useful for cleaning residue from semiconductor substrates
ADVANCED TECH MATERIALS115 citations97
US6755989B2Jun 29, 2004
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS43 citations96
US6344432B1Feb 5, 2002
Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures
ADVANCED TECH MATERIALS51 citations96
US7300601B2Nov 27, 2007
Passivative chemical mechanical polishing composition for copper film planarization
ADVANCED TECH MATERIALS45 citations94
US6967169B2Nov 22, 2005
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS16 citations92
US6800218B2Oct 5, 2004
Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same
ADVANCED TECH MATERIALS36 citations92
US6849200B2Feb 1, 2005
Composition and process for wet stripping removal of sacrificial anti-reflective material
ADVANCED TECH MATERIALS45 citations89
US7605113B2Oct 20, 2009
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS11 citations84
US7662762B2Feb 16, 2010
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates
ADVANCED TECH MATERIALS4 citations62
US9109188B2Aug 18, 2015
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
ADVANCED TECH MATERIALS0 citations52