Inventor · disambiguated record
Hironori Mizuta
Also filed as: MIZUTA HIRONORI
11 granted patents·7 pending applications·40 citations·filing 2001–2021
84Inventor score
Files withWAKO PURE CHEM IND LTD6FUJIFILM WAKO PURE CHEMICAL CORP5MIZUTA HIRONORI5FUJIFILM CORP1KAWADA HIROMI1
Top patents by PatentIndex Score
18 records- 0183US9862914B2Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surfaceWAKO PURE CHEM IND LTD·Filed 2014·Granted Jan 9, 2018·7 cites·17 claims
- 0283US7375066B2Semiconductor wafer cleaning agent and cleaning methodWAKO PURE CHEM IND LTD·Filed 2001·Granted May 20, 2008·25 cites·31 claims
- 0368US8900371B2Cleaning agent for substrate and cleaning methodMIZUTA HIRONORI·Filed 2011·Granted Dec 2, 2014·2 cites·7 claims
- 0466US9034810B2Processing agent composition for semiconductor surface and method for processing semiconductor surface using sameMIZUTA HIRONORI·Filed 2010·Granted May 19, 2015·3 cites·27 claims
- 0556US9803161B2Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surfaceWAKO PURE CHEM IND LTD·Filed 2013·Granted Oct 31, 2017·1 cites·7 claims
- 0650US2022069354A1Sulfur-based electrolyte solution for magnesium cellFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 0748US12312569B2Kit for cleaning agent and method for preparing cleaning agentFUJIFILM CORP·Filed 2021·Granted May 27, 2025·0 cites·13 claims
- 0848US10367231B2Magnesium-containing electrolytic solutionFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2015·Granted Jul 30, 2019·0 cites·11 claims
- 0948US7700532B2Cleaning composition and method of cleaning therewithWAKO PURE CHEM IND LTD·Filed 2003·Granted Apr 20, 2010·2 cites·6 claims
- 1046US8828918B2Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent compositionMIZUTA HIRONORI·Filed 2009·Granted Sep 9, 2014·0 cites·28 claims
- 1146US2021280870A1Positive electrode active material for magnesium batteriesFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 1242US2007235061A1Cleaning Agent for Substrate and Cleaning MethodWAKO PURE CHEM IND LTD·Filed 2004·Application pending·0 cites
- 1342US2016060584A1Cleaning agent for metal wiring substrate, and method for cleaning semiconductor substrateWAKO PURE CHEM IND LTD·Filed 2014·Application pending·0 cites
- 1437US11258066B2Binder agent composition for lithium batteryFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2018·Granted Feb 22, 2022·0 cites·14 claims
- 1536US9006164B2Resist remover composition and method for removing resist using the compositionMIZUTA HIRONORI·Filed 2010·Granted Apr 14, 2015·0 cites·16 claims
- 1636US2013171835A1Composition for water-repellent treatment of surface, and method for water-repellent treatment of surface of semiconductor substrate using sameMIZUTA HIRONORI·Filed 2011·Application pending·0 cites
- 1735US2019367657A1Binder agent composition for lithium battery electrode, and electrode using sameFUJIFILM WAKO PURE CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 1830US2013261040A1Substrate cleaner for copper wiring, and method for cleaning copper wiring semiconductor substrateKAWADA HIROMI·Filed 2011·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →