P

Inventor

CHEN SSU-YU

TW21 patents

Patents

21 patents
US11086237B2Aug 10, 2021

Extreme ultraviolet lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US12055865B2Aug 6, 2024

Extreme ultraviolet lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10955762B2Mar 23, 2021

Radiation source apparatus and method for decreasing debris in radiation source apparatus

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10877378B2Dec 29, 2020

Vessel for extreme ultraviolet radiation source

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10791616B1Sep 29, 2020

Radiation source apparatus

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10712676B2Jul 14, 2020

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10512147B1Dec 17, 2019

Extreme ultraviolet radiation source and droplet catcher thereof

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10495987B2Dec 3, 2019

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US12379675B2Aug 5, 2025

Extreme ultraviolet lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12282262B2Apr 22, 2025

Method for controlling extreme ultraviolet light

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12235594B2Feb 25, 2025

Method for performing lithography process, light source, and EUV lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12207381B2Jan 21, 2025

Extreme ultraviolet lithography system with heated tin vane bucket having a heated cover

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12130556B2Oct 29, 2024

Plasma position control for extreme ultraviolet lithography light sources

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11703769B2Jul 18, 2023

Light source, EUV lithography system, and method for performing circuit layout patterning process

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11650508B2May 16, 2023

Plasma position control for extreme ultraviolet lithography light sources

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11531278B2Dec 20, 2022

EUV lithography system and method for decreasing debris in EUV lithography system

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11333983B2May 17, 2022

Light source, EUV lithography system, and method for generating EUV radiation

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11320744B2May 3, 2022

Method and apparatus for controlling extreme ultraviolet light

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11297710B2Apr 5, 2022

Extreme ultraviolet lithography system with heated tin vane bucket having a heated cover

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10824083B2Nov 3, 2020

Light source, EUV lithography system, and method for generating EUV radiation

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US11360392B2Jun 14, 2022

Photolithography device having illuminator and method for adjusting intensity uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49