Inventor

FU TZUNG-CHI

TW68 patents

⚠️ This page may combine multiple inventors who share the name “FU TZUNG-CHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FU TZUNG-CHI

TAIWAN SEMICONDUCTOR MFG CO LTD

System and method for extreme ultraviolet source control

Residual gain monitoring and reduction for EUV drive laser

EUV radiation modification methods and systems

EUV vessel inspection method and related system

Particle removal method

EUV light source and apparatus for lithography

EUV radiation modification methods and systems

EUV light source and apparatus for lithography

Residual gain monitoring and reduction for EUV drive laser

Radiation source apparatus and method for decreasing debris in radiation source apparatus

EUV radiation modification methods and systems

System and method for extreme ultraviolet source control

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system

Light source for lithography exposure process

System and method of discharging an EUV mask

Reticle carrier and associated methods

Collector pellicle

EUV vessel inspection method and related system

Lithography system and method

Lithography system and method

Particle removal apparatus, particle removal system and particle removal method

Lithography process and system with enhanced overlay quality

System and method for cleaning an EUV mask

Method for performing lithography process, light source, and EUV lithography system

Reticle carrier and associated methods

EUV light source and apparatus for lithography

Method of lithography process and transferring a reticle

Residual gain monitoring and reduction for EUV drive laser

EUV radiation generation methods and systems

Light source, EUV lithography system, and method for performing circuit layout patterning process

Method of lithography process using reticle container with discharging device

Mask for attracting charged particles and method for using the same

EUV lithography system and method for decreasing debris in EUV lithography system

Light source for lithography exposure process

Light source, EUV lithography system, and method for generating EUV radiation

Reticle with conductive material structure

System and method for extreme ultraviolet source control

EUV collector contamination prevention

EUV vessel inspection method and related system

Light source for lithography exposure process

EUV collector contamination prevention

Particle removal apparatus

Lithography system and method

Methods and systems for aligning master oscillator power amplifier systems

TAIWAN SEMICONDUCTOR MFG

Apparatus and method for degassing and preventing gelation in a viscous liquid

Method and apparatus for dispensing resist solution

PENG JUI-CHUNG

System and method for improving immersion scanner overlay performance

System and method for improving immersion scanner overlay performance

HSU CHIA-HAO

Method for extreme ultraviolet electrostatic chuck with reduced clamp effect