Inventor
LIU BO-TSUN
TW56 patents
Patents
50 patentsUS10314154B1Jun 4, 2019
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations92
US10656539B2May 19, 2020
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10524345B2Dec 31, 2019
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US10429729B2Oct 1, 2019
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10718718B2Jul 21, 2020
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations83
US11419203B2Aug 16, 2022
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11275318B2Mar 15, 2022
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11013097B2May 18, 2021
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10976674B2Apr 13, 2021
Method for detecting EUV pellicle rupture
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10980100B2Apr 13, 2021
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10955762B2Mar 23, 2021
Radiation source apparatus and method for decreasing debris in radiation source apparatus
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10928741B2Feb 23, 2021
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10917959B2Feb 9, 2021
EUV radiation modification methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10842009B2Nov 17, 2020
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10712676B2Jul 14, 2020
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10509324B2Dec 17, 2019
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10495987B2Dec 3, 2019
Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10477663B2Nov 12, 2019
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10338475B2Jul 2, 2019
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10165664B1Dec 25, 2018
Apparatus for decontaminating windows of an EUV source module
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US11392022B2Jul 19, 2022
Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US10429314B2Oct 1, 2019
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US11774844B2Oct 3, 2023
Extreme ultraviolet mask and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US11275301B2Mar 15, 2022
Extreme ultraviolet mask and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US12517434B2Jan 6, 2026
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12302484B2May 13, 2025
Droplet generator and method of servicing extreme ultraviolet imaging tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12235594B2Feb 25, 2025
Method for performing lithography process, light source, and EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12193136B2Jan 7, 2025
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12072633B2Aug 27, 2024
Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12013641B2Jun 18, 2024
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11829082B2Nov 28, 2023
Radiation source for lithography process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11792909B2Oct 17, 2023
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11737200B2Aug 22, 2023
Residual gain monitoring and reduction for EUV drive laser
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11723141B2Aug 8, 2023
EUV radiation generation methods and systems
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11720025B2Aug 8, 2023
Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11703762B2Jul 18, 2023
Method of reducing undesired light influence in extreme ultraviolet exposure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11703769B2Jul 18, 2023
Light source, EUV lithography system, and method for performing circuit layout patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11630393B2Apr 18, 2023
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11617255B2Mar 28, 2023
Droplet generator and method of servicing extreme ultraviolet imaging tool
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11531278B2Dec 20, 2022
EUV lithography system and method for decreasing debris in EUV lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11483918B2Oct 25, 2022
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11333983B2May 17, 2022
Light source, EUV lithography system, and method for generating EUV radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11269257B2Mar 8, 2022
Apparatus and method for generating extreme ultraviolet radiation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11224115B2Jan 11, 2022
System and method for extreme ultraviolet source control
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11092555B2Aug 17, 2021
EUV vessel inspection method and related system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10993308B2Apr 27, 2021
Light source for lithography exposure process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12347997B2Jul 1, 2025
Methods and systems for aligning master oscillator power amplifier systems
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12181791B2Dec 31, 2024
Extreme ultraviolet mask and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11973302B2Apr 30, 2024
Methods and systems for aligning master oscillator power amplifier systems
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11588293B2Feb 21, 2023
Methods and systems for aligning master oscillator power amplifier systems
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
Showing the top 50 of 56 patents by PatentIndex Score.