Inventor
LIN LI-TE
TW116 patents
⚠️ This page may combine multiple inventors who share the name “LIN LI-TE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
46 patentsUS10998421B2May 4, 2021
Reducing pattern loading in the etch-back of metal gate
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10861698B2Dec 8, 2020
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10790195B2Sep 29, 2020
Elongated pattern and formation thereof
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10164067B2Dec 25, 2018
Method of fabricating a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9627258B1Apr 18, 2017
Method of forming a contact
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US12310043B2May 20, 2025
Method of fabricating a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations75
US11791161B2Oct 17, 2023
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11776850B2Oct 3, 2023
Semiconductor device with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11769822B2Sep 26, 2023
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11646234B2May 9, 2023
Method for FinFET fabrication and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11626506B2Apr 11, 2023
Reducing pattern loading in the etch-back of metal gate
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11469143B2Oct 11, 2022
Semiconductor device with elongated pattern
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11264281B2Mar 1, 2022
Semiconductor device with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11217487B2Jan 4, 2022
Semiconductor arrangement and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11195759B2Dec 7, 2021
Semiconductor arrangement and method for making
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11183580B2Nov 23, 2021
Structure and formation method of semiconductor device with metal gate stack
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11145749B2Oct 12, 2021
Method of fabricating a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11107907B2Aug 31, 2021
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11094556B2Aug 17, 2021
Method of manufacturing semiconductor devices using directional process
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10957779B2Mar 23, 2021
Gate etch back with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10950434B2Mar 16, 2021
Methods of reducing gate spacer loss during semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10861953B2Dec 8, 2020
Air spacers in transistors and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10741671B2Aug 11, 2020
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10707081B2Jul 7, 2020
Fine line patterning methods
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10157751B1Dec 18, 2018
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10032887B2Jul 24, 2018
Method of forming a contact
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11942372B2Mar 26, 2024
Dielectric protection layer in middle-of-line interconnect structure manufacturing method
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations72
US11855192B2Dec 26, 2023
Semiconductor device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12002663B2Jun 4, 2024
Processing apparatus and method for forming semiconductor structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12575156B2Mar 10, 2026
Reducing pattern loading in the etch-back of metal gate
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12520558B2Jan 6, 2026
High selectivity etching with germanium-containing gases
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12471344B2Nov 11, 2025
Dry etching of semiconductor structures with fluorine-containing gases
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12396245B2Aug 19, 2025
Semiconductor arrangement and method for making
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12396205B2Aug 19, 2025
Semiconductor device having fins and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12389619B2Aug 12, 2025
Semiconductor device structure with inner spacer layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12356646B2Jul 8, 2025
Semiconductor device and method for manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12334342B2Jun 17, 2025
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12336252B2Jun 17, 2025
Inner spacer formation in multi-gate transistors
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12261085B2Mar 25, 2025
Semiconductor device with reduced loading effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12230507B2Feb 18, 2025
Method of manufacturing semiconductor devices using directional process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12224210B2Feb 11, 2025
Method for FinFet fabrication and structure thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12198939B2Jan 14, 2025
Technique for semiconductor manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12154970B2Nov 26, 2024
Method for semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12154969B2Nov 26, 2024
Semiconductor device structure with metal gate stack
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12125897B2Oct 22, 2024
Air spacers in transistors and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12094951B1Sep 17, 2024
Capping structures in semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
TAIWAN SEMICONDUCTOR MFG
4 patentsUS6743732B1Jun 1, 2004
Organic low K dielectric etch with NH3 chemistry
TAIWAN SEMICONDUCTOR MFG249 citations99
US6407002B1Jun 18, 2002
Partial resist free approach in contact etch to improve W-filling
TAIWAN SEMICONDUCTOR MFG83 citations98
US7390753B2Jun 24, 2008
In-situ plasma treatment of advanced resists in fine pattern definition
TAIWAN SEMICONDUCTOR MFG9 citations82
US7109085B2Sep 19, 2006
Etching process to avoid polysilicon notching
TAIWAN SEMICONDUCTOR MFG10 citations74
Showing the top 50 of 116 patents by PatentIndex Score.