Inventor

HSIAW HAN-TI

TW20 patents

⚠️ This page may combine multiple inventors who share the name “HSIAW HAN-TI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HSIAW HAN-TI

TAIWAN SEMICONDUCTOR MFG CO LTD

Contact openings and methods forming same

Semiconductor device and methods of manufacture

Flowable films and methods of forming flowable films

Semiconductor device and method

Semiconductor device and methods of manufacture

Integrated bi-layer STI deposition

Method of back-end-of-line (BEOL) fabrication, and devices formed by the method

Contact openings and methods forming same

Method of manufacturing a semiconductor device with a work-function layer having a concentration of fluorine

Semiconductor device with a work function layer having a concentration of fluorine

Isolation regions including two layers and method forming same

Isolation regions including two layers and method forming same

High density dielectric etch-stop layer

Method of forming a high density dielectric etch-stop layer

Contact openings and methods forming same

Optical filtering for integrated dielectrics UV curing processes

Semiconductor device and methods of manufacture

Method and equipment for removing photoresist residue after dry etch

TAIWAN SEMICONDUCTOR MFG

Hard mask for back-end-of-line (BEOL) interconnect structure

ILD stack with improved CMP results