Inventor
CHANG SHIH-MING
TW174 patents
⚠️ This page may combine multiple inventors who share the name “CHANG SHIH-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
29 patentsUS9501601B2Nov 22, 2016
Layout optimization of a main pattern and a cut pattern
TAIWAN SEMICONDUCTOR MFG CO LTD104 citations99
US9716032B2Jul 25, 2017
Via-free interconnect structure with self-aligned metal line interconnections
TAIWAN SEMICONDUCTOR MFG CO LTD48 citations98
US9529268B2Dec 27, 2016
Systems and methods for improving pattern transfer
TAIWAN SEMICONDUCTOR MFG CO LTD363 citations98
US10678142B2Jun 9, 2020
Optical proximity correction and photomasks
TAIWAN SEMICONDUCTOR MFG CO LTD13 citations85
US11004855B2May 11, 2021
Buried metal track and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10734321B2Aug 4, 2020
Integrated circuit and method of manufacturing same
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10497565B2Dec 3, 2019
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10459353B2Oct 29, 2019
Lithography system with an embedded cleaning module
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10446555B2Oct 15, 2019
Buried metal track and methods forming same
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10163652B2Dec 25, 2018
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9911623B2Mar 6, 2018
Via connection to a partially filled trench
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9852908B2Dec 26, 2017
Methods for integrated circuit design and fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9672320B2Jun 6, 2017
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11714951B2Aug 1, 2023
Geometric mask rule check with favorable and unfavorable zones
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations74
US10770303B2Sep 8, 2020
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10515823B2Dec 24, 2019
Via connection to a partially filled trench
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10495982B2Dec 3, 2019
System and method for real-time overlay error reduction
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10410863B2Sep 10, 2019
Methods for integrated circuit design and fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10276363B2Apr 30, 2019
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10001698B2Jun 19, 2018
Layout hierachical structure defined in polar coordinate
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9897929B2Feb 20, 2018
Homogeneous thermal equalization with active device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9875906B2Jan 23, 2018
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9786602B2Oct 10, 2017
Interconnection structure and methods of fabrication the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9761436B2Sep 12, 2017
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9735140B2Aug 15, 2017
Systems and methods for a sequential spacer scheme
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9684236B1Jun 20, 2017
Method of patterning a film layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9581900B2Feb 28, 2017
Self aligned patterning with multiple resist layers
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9541846B2Jan 10, 2017
Homogeneous thermal equalization with active device
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9465906B2Oct 11, 2016
System and method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
TAIWAN SEMICONDUCTOR MFG
13 patentsUS9153478B2Oct 6, 2015
Spacer etching process for integrated circuit design
TAIWAN SEMICONDUCTOR MFG118 citations99
US9053279B2Jun 9, 2015
Pattern modification with a preferred position function
TAIWAN SEMICONDUCTOR MFG104 citations99
US8716841B1May 6, 2014
Photolithography mask and process
TAIWAN SEMICONDUCTOR MFG66 citations98
US8962464B1Feb 24, 2015
Self-alignment for using two or more layers and methods of forming same
TAIWAN SEMICONDUCTOR MFG16 citations93
US8835323B1Sep 16, 2014
Method for integrated circuit patterning
TAIWAN SEMICONDUCTOR MFG22 citations93
US7383530B2Jun 3, 2008
System and method for examining mask pattern fidelity
TAIWAN SEMICONDUCTOR MFG27 citations92
US9362132B2Jun 7, 2016
Systems and methods for a sequential spacer scheme
TAIWAN SEMICONDUCTOR MFG4 citations84
US9293341B2Mar 22, 2016
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG7 citations84
US9245763B2Jan 26, 2016
Mechanisms for forming patterns using multiple lithography processes
TAIWAN SEMICONDUCTOR MFG6 citations84
US8828885B2Sep 9, 2014
Photo resist trimmed line end space
TAIWAN SEMICONDUCTOR MFG5 citations84
US7883601B2Feb 8, 2011
Apparatus and method for controlling relative particle speeds in a plasma
TAIWAN SEMICONDUCTOR MFG8 citations84
US9081289B2Jul 14, 2015
System and method for optimization of an imaged pattern of a semiconductor device
TAIWAN SEMICONDUCTOR MFG5 citations80
US7897008B2Mar 1, 2011
Apparatus and method for regional plasma control
TAIWAN SEMICONDUCTOR MFG6 citations74
CHANG SHIH-MING
3 patentsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD
1 patentCIXI HAOSHENG ELECTRONICS & HARDWARE CO LTD
1 patentTANG YU-PO
1 patentCIXI HAOSHENG ELECTRONICS & HA
1 patentVANGUARD INT SEMICONDUCT CORP
1 patentShowing the top 50 of 174 patents by PatentIndex Score.