P

Inventor

CHANG SHIH-MING

TW174 patents
⚠️ This page may combine multiple inventors who share the name “CHANG SHIH-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

29 patents
US9501601B2Nov 22, 2016

Layout optimization of a main pattern and a cut pattern

TAIWAN SEMICONDUCTOR MFG CO LTD104 citations99
US9716032B2Jul 25, 2017

Via-free interconnect structure with self-aligned metal line interconnections

TAIWAN SEMICONDUCTOR MFG CO LTD48 citations98
US9529268B2Dec 27, 2016

Systems and methods for improving pattern transfer

TAIWAN SEMICONDUCTOR MFG CO LTD363 citations98
US10678142B2Jun 9, 2020

Optical proximity correction and photomasks

TAIWAN SEMICONDUCTOR MFG CO LTD13 citations85
US11004855B2May 11, 2021

Buried metal track and methods forming same

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10734321B2Aug 4, 2020

Integrated circuit and method of manufacturing same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10497565B2Dec 3, 2019

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10459353B2Oct 29, 2019

Lithography system with an embedded cleaning module

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10446555B2Oct 15, 2019

Buried metal track and methods forming same

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10163652B2Dec 25, 2018

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9911623B2Mar 6, 2018

Via connection to a partially filled trench

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9852908B2Dec 26, 2017

Methods for integrated circuit design and fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9672320B2Jun 6, 2017

Method for integrated circuit manufacturing

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US11714951B2Aug 1, 2023

Geometric mask rule check with favorable and unfavorable zones

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations74
US10770303B2Sep 8, 2020

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10515823B2Dec 24, 2019

Via connection to a partially filled trench

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10495982B2Dec 3, 2019

System and method for real-time overlay error reduction

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10410863B2Sep 10, 2019

Methods for integrated circuit design and fabrication

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10276363B2Apr 30, 2019

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10001698B2Jun 19, 2018

Layout hierachical structure defined in polar coordinate

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9897929B2Feb 20, 2018

Homogeneous thermal equalization with active device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9875906B2Jan 23, 2018

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9786602B2Oct 10, 2017

Interconnection structure and methods of fabrication the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9761436B2Sep 12, 2017

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9735140B2Aug 15, 2017

Systems and methods for a sequential spacer scheme

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US9684236B1Jun 20, 2017

Method of patterning a film layer

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9581900B2Feb 28, 2017

Self aligned patterning with multiple resist layers

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9541846B2Jan 10, 2017

Homogeneous thermal equalization with active device

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9465906B2Oct 11, 2016

System and method for integrated circuit manufacturing

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73

TAIWAN SEMICONDUCTOR MFG

13 patents
US9153478B2Oct 6, 2015

Spacer etching process for integrated circuit design

TAIWAN SEMICONDUCTOR MFG118 citations99
US9053279B2Jun 9, 2015

Pattern modification with a preferred position function

TAIWAN SEMICONDUCTOR MFG104 citations99
US8716841B1May 6, 2014

Photolithography mask and process

TAIWAN SEMICONDUCTOR MFG66 citations98
US8962464B1Feb 24, 2015

Self-alignment for using two or more layers and methods of forming same

TAIWAN SEMICONDUCTOR MFG16 citations93
US8835323B1Sep 16, 2014

Method for integrated circuit patterning

TAIWAN SEMICONDUCTOR MFG22 citations93
US7383530B2Jun 3, 2008

System and method for examining mask pattern fidelity

TAIWAN SEMICONDUCTOR MFG27 citations92
US9362132B2Jun 7, 2016

Systems and methods for a sequential spacer scheme

TAIWAN SEMICONDUCTOR MFG4 citations84
US9293341B2Mar 22, 2016

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG7 citations84
US9245763B2Jan 26, 2016

Mechanisms for forming patterns using multiple lithography processes

TAIWAN SEMICONDUCTOR MFG6 citations84
US8828885B2Sep 9, 2014

Photo resist trimmed line end space

TAIWAN SEMICONDUCTOR MFG5 citations84
US7883601B2Feb 8, 2011

Apparatus and method for controlling relative particle speeds in a plasma

TAIWAN SEMICONDUCTOR MFG8 citations84
US9081289B2Jul 14, 2015

System and method for optimization of an imaged pattern of a semiconductor device

TAIWAN SEMICONDUCTOR MFG5 citations80
US7897008B2Mar 1, 2011

Apparatus and method for regional plasma control

TAIWAN SEMICONDUCTOR MFG6 citations74

CHANG SHIH-MING

3 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

1 patent

CIXI HAOSHENG ELECTRONICS & HARDWARE CO LTD

1 patent

TANG YU-PO

1 patent

CIXI HAOSHENG ELECTRONICS & HA

1 patent

VANGUARD INT SEMICONDUCT CORP

1 patent

Showing the top 50 of 174 patents by PatentIndex Score.