Inventor
LIN WEI-LIANG
TW85 patents
⚠️ This page may combine multiple inventors who share the name “LIN WEI-LIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
33 patentsUS11342193B2May 24, 2022
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10861698B2Dec 8, 2020
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10790155B2Sep 29, 2020
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10658184B2May 19, 2020
Pattern fidelity enhancement with directional patterning technology
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10497565B2Dec 3, 2019
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US10049918B2Aug 14, 2018
Directional patterning methods
TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US9679994B1Jun 13, 2017
High fin cut fabrication process
TAIWAN SEMICONDUCTOR MFG CO LTD18 citations84
US11791161B2Oct 17, 2023
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11289332B2Mar 29, 2022
Directional processing to remove a layer or a material formed over a substrate
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11094556B2Aug 17, 2021
Method of manufacturing semiconductor devices using directional process
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US11004729B2May 11, 2021
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US10950456B2Mar 16, 2021
High-density semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10714357B2Jul 14, 2020
Methods for improved critical dimension uniformity in a semiconductor device fabrication process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10714485B2Jul 14, 2020
Semiconductor device which includes Fins
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10707081B2Jul 7, 2020
Fine line patterning methods
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10354874B2Jul 16, 2019
Directional processing to remove a layer or a material formed over a substrate
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9991132B2Jun 5, 2018
Lithographic technique incorporating varied pattern materials
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US9799529B2Oct 24, 2017
Method of planarizing a film layer
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US9728407B2Aug 8, 2017
Method of forming features with various dimensions
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9684236B1Jun 20, 2017
Method of patterning a film layer
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9449880B1Sep 20, 2016
Fin patterning methods for increased process margin
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US10146141B2Dec 4, 2018
Lithography process and system with enhanced overlay quality
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US12266539B2Apr 1, 2025
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12148653B2Nov 19, 2024
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US11764068B2Sep 19, 2023
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12334342B2Jun 17, 2025
Pattern fidelity enhancement
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12230507B2Feb 18, 2025
Method of manufacturing semiconductor devices using directional process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12153350B2Nov 26, 2024
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11955338B2Apr 9, 2024
Directional deposition for semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11901188B2Feb 13, 2024
Method for improved critical dimension uniformity in a semiconductor device fabrication process
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11881401B2Jan 23, 2024
Method of forming metal features
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11862465B2Jan 2, 2024
Fine line patterning methods
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11848208B2Dec 19, 2023
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
ACBEL POLYTECH INC
4 patentsUS8040102B2Oct 18, 2011
Solar-powered LED street light
ACBEL POLYTECH INC23 citations89
US7729143B2Jun 1, 2010
Power supply having an extending hold-up time controlling unit
ACBEL POLYTECH INC15 citations83
US9997994B1Jun 12, 2018
Totem-pole power factor corrector and current-sampling unit thereof
ACBEL POLYTECH INC15 citations81
US7911811B2Mar 22, 2011
Switching power supply with increased efficiency at light load
ACBEL POLYTECH INC5 citations63
MACRONIX INT CO LTD
4 patentsUS10741262B2Aug 11, 2020
NAND flash operating techniques mitigating program disturbance
MACRONIX INT CO LTD11 citations85
US9830992B1Nov 28, 2017
Operation method of non-volatile memory cell and applications thereof
MACRONIX INT CO LTD10 citations84
US11641744B2May 2, 2023
Method for fabricating memory device
MACRONIX INT CO LTD0 citations63
US11289502B2Mar 29, 2022
Memory device and method for fabricating the same
MACRONIX INT CO LTD0 citations63
CHANG SHUN-TE
2 patentsWANG YEN-LUNG
1 patentLIN WEI-LIANG
1 patentLIN WEI LIANG
1 patentWANG CHIEN-WEI
1 patentLI DONG-SHENG
1 patentLEE FANG-YU
1 patentTENG SHIH-LIANG
1 patentShowing the top 50 of 85 patents by PatentIndex Score.