P

Inventor

TSENG CHIN-YUAN

TW23 patents
⚠️ This page may combine multiple inventors who share the name “TSENG CHIN-YUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

22 patents
US10497565B2Dec 3, 2019

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9679994B1Jun 13, 2017

High fin cut fabrication process

TAIWAN SEMICONDUCTOR MFG CO LTD18 citations84
US9672320B2Jun 6, 2017

Method for integrated circuit manufacturing

TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10950456B2Mar 16, 2021

High-density semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10714485B2Jul 14, 2020

Semiconductor device which includes Fins

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US9991132B2Jun 5, 2018

Lithographic technique incorporating varied pattern materials

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US9449880B1Sep 20, 2016

Fin patterning methods for increased process margin

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US11848208B2Dec 19, 2023

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11616067B2Mar 28, 2023

Method of making semiconductor device which includes Fins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11532482B2Dec 20, 2022

High-density semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11437239B2Sep 6, 2022

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11222899B2Jan 11, 2022

Semiconductor device which includes fins and method of making same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11081354B2Aug 3, 2021

Fin patterning methods for increased process margins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10971363B2Apr 6, 2021

Method for forming semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10957551B2Mar 23, 2021

Fin-like field effect transistor patterning methods for increasing process margins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11901190B2Feb 13, 2024

Method of patterning

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10535520B2Jan 14, 2020

Fin patterning methods for increased process margins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10446406B2Oct 15, 2019

High-density semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10418252B2Sep 17, 2019

Fin-like field effect transistor patterning methods for increasing process margins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10312109B2Jun 4, 2019

Lithographic technique incorporating varied pattern materials

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10074657B2Sep 11, 2018

Method of manufacturing fins and semiconductor device which includes fins

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9530660B2Dec 27, 2016

Multiple directed self-assembly patterning process

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52

MEDIATEK INC

1 patent