Inventor
TSENG CHIN-YUAN
TW23 patents
⚠️ This page may combine multiple inventors who share the name “TSENG CHIN-YUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
22 patentsUS10497565B2Dec 3, 2019
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9679994B1Jun 13, 2017
High fin cut fabrication process
TAIWAN SEMICONDUCTOR MFG CO LTD18 citations84
US9672320B2Jun 6, 2017
Method for integrated circuit manufacturing
TAIWAN SEMICONDUCTOR MFG CO LTD10 citations84
US10950456B2Mar 16, 2021
High-density semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10714485B2Jul 14, 2020
Semiconductor device which includes Fins
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US9991132B2Jun 5, 2018
Lithographic technique incorporating varied pattern materials
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US9449880B1Sep 20, 2016
Fin patterning methods for increased process margin
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US11848208B2Dec 19, 2023
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11616067B2Mar 28, 2023
Method of making semiconductor device which includes Fins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11532482B2Dec 20, 2022
High-density semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11437239B2Sep 6, 2022
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11222899B2Jan 11, 2022
Semiconductor device which includes fins and method of making same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11081354B2Aug 3, 2021
Fin patterning methods for increased process margins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10971363B2Apr 6, 2021
Method for forming semiconductor device structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10957551B2Mar 23, 2021
Fin-like field effect transistor patterning methods for increasing process margins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11901190B2Feb 13, 2024
Method of patterning
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10535520B2Jan 14, 2020
Fin patterning methods for increased process margins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10446406B2Oct 15, 2019
High-density semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10418252B2Sep 17, 2019
Fin-like field effect transistor patterning methods for increasing process margins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10312109B2Jun 4, 2019
Lithographic technique incorporating varied pattern materials
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10074657B2Sep 11, 2018
Method of manufacturing fins and semiconductor device which includes fins
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9530660B2Dec 27, 2016
Multiple directed self-assembly patterning process
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52