Inventor
FUKIAGE NORIAKI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “FUKIAGE NORIAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
24 patentsUS7862683B2Jan 4, 2011
Chamber dry cleaning
TOKYO ELECTRON LTD27 citations92
US6753610B1Jun 22, 2004
Semiconductor device having multilayer interconnection structure and method of making the same
TOKYO ELECTRON LTD19 citations92
US6699531B1Mar 2, 2004
Plasma treatment method
TOKYO ELECTRON LTD29 citations92
US7201174B2Apr 10, 2007
Processing apparatus and cleaning method
TOKYO ELECTRON LTD18 citations83
US9478410B2Oct 25, 2016
Method of forming nitride film with plasma
TOKYO ELECTRON LTD13 citations81
US7371436B2May 13, 2008
Method and apparatus for depositing materials with tunable optical properties and etching characteristics
TOKYO ELECTRON LTD7 citations73
US6773762B1Aug 10, 2004
Plasma treatment method
TOKYO ELECTRON LTD12 citations73
US10573512B2Feb 25, 2020
Film forming method
TOKYO ELECTRON LTD2 citations72
US10151029B2Dec 11, 2018
Silicon nitride film forming method and silicon nitride film forming apparatus
TOKYO ELECTRON LTD4 citations72
US10438791B2Oct 8, 2019
Film forming method, film forming apparatus, and storage medium
TOKYO ELECTRON LTD2 citations71
US7718497B2May 18, 2010
Method for manufacturing semiconductor device
TOKYO ELECTRON LTD3 citations63
US7611758B2Nov 3, 2009
Method of improving post-develop photoresist profile on a deposited dielectric film
TOKYO ELECTRON LTD4 citations62
US6576569B1Jun 10, 2003
Method of plasma-assisted film deposition
TOKYO ELECTRON LTD2 citations62
US10900121B2Jan 26, 2021
Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations61
US11201053B2Dec 14, 2021
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations60
US10714332B2Jul 14, 2020
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations60
US11725276B2Aug 15, 2023
Plasma purge method
TOKYO ELECTRON LTD0 citations55
US11508571B2Nov 22, 2022
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations52
US9892909B2Feb 13, 2018
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations51
US12077855B2Sep 3, 2024
Cleaning method and film deposition apparatus
TOKYO ELECTRON LTD0 citations50
US11171014B2Nov 9, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US9922820B2Mar 20, 2018
Film forming method and film forming apparatus
TOKYO ELECTRON LTD1 citations50
US11970768B2Apr 30, 2024
Film forming method and film forming apparatus
TOKYO ELECTRON LTD0 citations47
US10626496B2Apr 21, 2020
Film forming apparatus, method of cleaning film forming apparatus, and storage medium
TOKYO ELECTRON LTD0 citations41