Inventor
LAFONTAINE BRUNO M
US16 patents
⚠️ This page may combine multiple inventors who share the name “LAFONTAINE BRUNO M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
14 patentsUS6977718B1Dec 20, 2005
Lithography method and system with adjustable reflector
ADVANCED MICRO DEVICES INC74 citations97
US6984475B1Jan 10, 2006
Extreme ultraviolet (EUV) lithography masks
ADVANCED MICRO DEVICES INC51 citations96
US7087907B1Aug 8, 2006
Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy
ADVANCED MICRO DEVICES INC46 citations92
US7081956B1Jul 25, 2006
Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system
ADVANCED MICRO DEVICES INC27 citations92
US6593037B1Jul 15, 2003
EUV mask or reticle having reduced reflections
ADVANCED MICRO DEVICES INC30 citations92
US7014966B2Mar 21, 2006
Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
ADVANCED MICRO DEVICES INC29 citations90
US6950176B1Sep 27, 2005
Method and system for monitoring EUV lithography mask flatness
ADVANCED MICRO DEVICES INC20 citations87
US7060401B1Jun 13, 2006
Phase-shift reflective mask for lithography, and method of using and fabricating
ADVANCED MICRO DEVICES INC8 citations73
US6977717B1Dec 20, 2005
Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system
ADVANCED MICRO DEVICES INC8 citations73
US7855048B1Dec 21, 2010
Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing
ADVANCED MICRO DEVICES INC2 citations62
US6696847B1Feb 24, 2004
Photo assisted electrical linewidth measurement method and apparatus
ADVANCED MICRO DEVICES INC1 citations52
US7858276B2Dec 28, 2010
Method for determining suitability of a resist in semiconductor wafer fabrication
ADVANCED MICRO DEVICES INC0 citations51
US7741012B1Jun 22, 2010
Method for removal of immersion lithography medium in immersion lithography processes
ADVANCED MICRO DEVICES INC1 citations50
US7276328B1Oct 2, 2007
Lithography mask utilizing asymmetric light source
ADVANCED MICRO DEVICES INC0 citations48