Inventor
OGASAWARA KOSUKE
JP13 patents
⚠️ This page may combine multiple inventors who share the name “OGASAWARA KOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
9 patentsUS9564342B2Feb 7, 2017
Method for controlling etching in pitch doubling
TOKYO ELECTRON LTD2 citations71
US11404282B2Aug 2, 2022
Method of etching film and plasma processing apparatus
TOKYO ELECTRON LTD2 citations66
US8980111B2Mar 17, 2015
Sidewall image transfer method for low aspect ratio patterns
TOKYO ELECTRON LTD3 citations62
US7871532B2Jan 18, 2011
Plasma processing method and post-processing method
TOKYO ELECTRON LTD6 citations62
US7662646B2Feb 16, 2010
Plasma processing method and plasma processing apparatus for performing accurate end point detection
TOKYO ELECTRON LTD2 citations62
US11721522B2Aug 8, 2023
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US11367590B2Jun 21, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations61
US12217973B2Feb 4, 2025
Method of etching film and plasma processing apparatus
TOKYO ELECTRON LTD0 citations56
US12525466B2Jan 13, 2026
Processing apparatus and processing method
TOKYO ELECTRON LTD0 citations50
OGASAWARA KOSUKE
3 patentsUS8580077B2Nov 12, 2013
Plasma processing apparatus for performing accurate end point detection
OGASAWARA KOSUKE5 citations70
US8187980B2May 29, 2012
Etching method, etching apparatus and storage medium
OGASAWARA KOSUKE1 citations48
US8232207B2Jul 31, 2012
Substrate processing method
OGASAWARA KOSUKE0 citations47