Inventor
KODAMA TERUHIKO
JP18 patents
Patents
18 patentsUS10074542B2Sep 11, 2018
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD6 citations82
US11554389B2Jan 17, 2023
Substrate cleaning apparatus and substrate cleaning method
TOKYO ELECTRON LTD2 citations72
US9711419B2Jul 18, 2017
Substrate backside texturing
TOKYO ELECTRON LTD3 citations72
US9601394B2Mar 21, 2017
Substrate processing apparatus, substrate processing method and memory medium
TOKYO ELECTRON LTD2 citations72
US10840079B2Nov 17, 2020
Substrate processing apparatus, substrate processing method and storage medium
TOKYO ELECTRON LTD2 citations68
US11693319B2Jul 4, 2023
Substrate processing method, substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD1 citations62
US11287798B2Mar 29, 2022
Substrate processing capable of suppressing a decrease in throughput while reducing the impact on exposure treatment caused by warping of a substrate
TOKYO ELECTRON LTD0 citations62
US11532487B2Dec 20, 2022
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations60
US12230515B2Feb 18, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations59
US11887869B2Jan 30, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations59
US11139182B2Oct 5, 2021
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD1 citations59
US10649335B2May 12, 2020
Substrate processing apparatus, substrate processing method and storage medium
TOKYO ELECTRON LTD0 citations51
US10528028B2Jan 7, 2020
Substrate processing apparatus, substrate processing method and memory medium
TOKYO ELECTRON LTD0 citations51
US11126086B2Sep 21, 2021
Substrate treatment apparatus, substrate treatment method, and computer storage medium
TOKYO ELECTRON LTD0 citations50
US9972512B2May 15, 2018
Liquid processing method, memory medium and liquid processing apparatus
TOKYO ELECTRON LTD0 citations48
US9786488B2Oct 10, 2017
Liquid processing method, memory medium and liquid processing apparatus
TOKYO ELECTRON LTD0 citations48
US12491600B2Dec 9, 2025
Substrate warpage correction method, computer storage medium, and substrate warpage correction apparatus
TOKYO ELECTRON LTD0 citations47
US12409470B2Sep 9, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations47