Inventor
VASSILIEV VLADISLAV
SG4 patents
Patents
4 patentsUS6180490B1Jan 30, 2001
Method of filling shallow trenches
CHARTERED SEMICONDUCTOR MFG174 citations97
US6197705B1Mar 6, 2001
Method of silicon oxide and silicon glass films deposition
CHARTERED SEMICONDUCTOR MFG299 citations96
US6500771B1Dec 31, 2002
Method of high-density plasma boron-containing silicate glass film deposition
CHARTERED SEMICONDUCTOR MFG24 citations92
US6355581B1Mar 12, 2002
Gas-phase additives for an enhancement of lateral etch component during high density plasma film deposition to improve film gap-fill capability
CHARTERED SEMICONDUCTOR MFG52 citations90