Inventor
OTSUBO TORU
JP25 patents
Patents
25 patentsUS6197151B1Mar 6, 2001
Plasma processing apparatus and plasma processing method
HITACHI LTD223 citations99
US6158383ADec 12, 2000
Plasma processing method and apparatus
HITACHI LTD339 citations99
US5275977AJan 4, 1994
Insulating film forming method for semiconductor device interconnection
HITACHI LTD343 citations99
US6245190B1Jun 12, 2001
Plasma processing system and plasma processing method
HITACHI LTD194 citations98
US6129806AOct 10, 2000
Plasma processing apparatus and plasma processing method
HITACHI LTD92 citations98
US5134965AAug 4, 1992
Processing apparatus and method for plasma processing
HITACHI LTD866 citations98
US6422172B1Jul 23, 2002
Plasma processing apparatus and plasma processing method
HITACHI LTD100 citations97
US5531862AJul 2, 1996
Method of and apparatus for removing foreign particles
HITACHI LTD125 citations97
US5759424AJun 2, 1998
Plasma processing apparatus and processing method
HITACHI LTD114 citations96
US4622094ANov 11, 1986
Method of controlling dry etching by applying an AC voltage to the workpiece
HITACHI LTD112 citations96
US4615620AOct 7, 1986
Apparatus for measuring the depth of fine engraved patterns
HITACHI LTD56 citations96
US4479848AOct 30, 1984
Etching method and apparatus
HITACHI LTD58 citations96
US5304277AApr 19, 1994
Plasma processing apparatus using plasma produced by microwaves
HITACHI LTD47 citations95
US4985109AJan 15, 1991
Apparatus for plasma processing
HITACHI LTD99 citations95
US4808258AFeb 28, 1989
Plasma processing method and apparatus for carrying out the same
HITACHI LTD98 citations95
US6537832B2Mar 25, 2003
Measuring apparatus and film formation method
HITACHI LTD18 citations93
US4776918AOct 11, 1988
Plasma processing apparatus
HITACHI LTD113 citations93
US6902683B1Jun 7, 2005
Plasma processing apparatus and plasma processing method
HITACHI LTD29 citations92
US4744660AMay 17, 1988
Apparatus for measuring difference in shallow level
HITACHI LTD36 citations92
US4487678ADec 11, 1984
Dry-etching apparatus
HITACHI LTD28 citations92
US6750977B2Jun 15, 2004
Apparatus for monitoring thickness of deposited layer in reactor and dry processing method
HITACHI LTD16 citations84
US4420233ADec 13, 1983
Projecting apparatus
HITACHI LTD26 citations81
US4840487AJun 20, 1989
Measuring apparatus for etching pits
HITACHI LTD13 citations74
US5762814AJun 9, 1998
Plasma processing method and apparatus using plasma produced by microwaves
HITACHI LTD12 citations73
US6797529B2Sep 28, 2004
Processing apparatus with measuring unit and method
HITACHI LTD3 citations63