Inventor

HORIKAWA TSUYOSHI

JP34 patents

⚠️ This page may combine multiple inventors who share the name “HORIKAWA TSUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HORIKAWA TSUYOSHI

MITSUBISHI ELECTRIC CORP

Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby

Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device

High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film

High dielectric constant thin film structure method for forming high dielectric constant thin film and apparatus for forming high dielectric contact thin film

Thin film forming apparatus using laser

Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device

Semiconductor device and manufacturing method thereof

Vaporizing device for CVD source materials and CVD apparatus employing the same

Semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium

Method of forming high dielectric constant thin film and method of manufacturing semiconductor device

CVD apparatus for forming thin film having high dielectric constant

Chemical vapor deposition apparatus

Semiconductor capacitor

Semiconductor memory device and method for producing the same

High dielectric constant thin film structure, method for forming high dielectric constant thin film and apparatus for forming high dielectric constant thin film

Optical writing type liquid crystal light valve and writing apparatus therefor

Liquid raw material vaporizer, semiconductor device and method of manufacturing semiconductor device

Method and apparatus for monitoring CVD liquid source for forming thin film with high dielectric constant

High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film

Semiconductor device with x-ray absorption layer

High dielectric constant thin film structure, method for forming high dielectric constant thin film, and apparatus for forming high dielectric constant thin film

Method of manufacturing semiconductor device which includes a capacitor having a lower electrode formed of iridium or ruthenium

Optical writing type liquid crystal light valve and writing apparatus therefor

Method of forming high dielectric constant thin film and method of manufacturing semiconductor device

RENESAS ELECTRONICS CORP

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing the same

Semiconductor device and method for manufacturing the same

RENESAS TECH CORP

Method of forming a film using chemical vapor deposition

Semiconductor device and manufacturing method thereof

OKI ELECTRIC IND CO LTD

Method of manufacturing an optical device having a stepwise or tapered light input/output part

Optical device having a stepwise or tapered light input/output part and manufacturing method therefor

PHOTONICS ELECTRONICS TECHNOLOGY RES ASS

Optical device

FUJI XEROX CO LTD

Power saving processing apparatus, image forming apparatus, and computer readable medium that are adaptable to abnormalities

NEC CORP

Optical waveguide circuit and method of fabricating same