Inventor

CHIU HSUEH-LIANG

TW2 patents

Patents

2 patents

US6063695AMay 16, 2000

Simplified process for the fabrication of deep clear laser marks using a photoresist mask

TAIWAN SEMICONDUCTOR MFG57 citations94

US5755891AMay 26, 1998

Method for post-etching of metal patterns

TAIWAN SEMICONDUCTOR MFG6 citations58