P

Inventor

BRACCHITTA JOHN A

US22 patents

Patents

22 patents
US6483156B1Nov 19, 2002

Double planar gated SOI MOSFET structure

IBM210 citations99
US6882015B2Apr 19, 2005

Intralevel decoupling capacitor, method of manufacture and testing circuit of the same

IBM49 citations96
US6677637B2Jan 13, 2004

Intralevel decoupling capacitor, method of manufacture and testing circuit of the same

IBM66 citations96
US6660596B2Dec 9, 2003

Double planar gated SOI MOSFET structure

IBM46 citations96
US6373095B1Apr 16, 2002

NVRAM cell having increased coupling ratio between a control gate and floating gate without an increase in cell area

IBM56 citations96
US6261895B1Jul 17, 2001

Polysilicon capacitor having large capacitance and low resistance and process for forming the capacitor

IBM47 citations96
US6130469AOct 10, 2000

Electrically alterable antifuse using FET

IBM70 citations96
US6100123AAug 8, 2000

Pillar CMOS structure

IBM49 citations96
US7195971B2Mar 27, 2007

Method of manufacturing an intralevel decoupling capacitor

IBM26 citations93
US6060358AMay 9, 2000

Damascene NVRAM cell and method of manufacture

IBM30 citations92
US6020777AFeb 1, 2000

Electrically programmable anti-fuse circuit

IBM27 citations92
US6394638B1May 28, 2002

Trench isolation for active areas and first level conductors

IBM19 citations91
US5734192AMar 31, 1998

Trench isolation for active areas and first level conductors

IBM29 citations91
US5518945AMay 21, 1996

Method of making a diffused lightly doped drain device with built in etch stop

IBM37 citations89
US6339015B1Jan 15, 2002

Method of fabricating a non-volatile semiconductor device

IBM7 citations74
US6255699B1Jul 3, 2001

Pillar CMOS structure

IBM10 citations74
US6858889B2Feb 22, 2005

Polysilicon capacitor having large capacitance and low resistance

IBM3 citations63
US6232633B1May 15, 2001

NVRAM cell using sharp tip for tunnel erase

IBM2 citations63
US7323382B2Jan 29, 2008

Intralevel decoupling capacitor, method of manufacture and testing circuit of the same

IBM0 citations52
US6344381B1Feb 5, 2002

Method for forming pillar CMOS

IBM0 citations52
US6420746B1Jul 16, 2002

Three device DRAM cell with integrated capacitor and local interconnect

IBM0 citations51
US6063687AMay 16, 2000

Formation of trench isolation for active areas and first level conductors

IBM0 citations50