Inventor
FAN YUH-DA
TW9 patents
⚠️ This page may combine multiple inventors who share the name “FAN YUH-DA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
8 patentsUS6124212ASep 26, 2000
High density plasma (HDP) etch method for suppressing micro-loading effects when etching polysilicon layers
TAIWAN SEMICONDUCTOR MFG101 citations96
US6936544B2Aug 30, 2005
Method of removing metal etching residues following a metal etchback process to improve a CMP process
TAIWAN SEMICONDUCTOR MFG105 citations95
US6022809AFeb 8, 2000
Composite shadow ring for an etch chamber and method of using
TAIWAN SEMICONDUCTOR MFG65 citations94
US5854136ADec 29, 1998
Three-step nitride etching process for better critical dimension and better vertical sidewall profile
TAIWAN SEMICONDUCTOR MFG48 citations92
US6303509B1Oct 16, 2001
Method to calibrate the wafer transfer for oxide etcher (with clamp)
TAIWAN SEMICONDUCTOR MFG35 citations90
US6221745B1Apr 24, 2001
High selectivity mask oxide etching to suppress silicon pits
TAIWAN SEMICONDUCTOR MFG10 citations72
US6531326B2Mar 11, 2003
Method to calibrate the wafer transfer for oxide etcher (with clamp)
TAIWAN SEMICONDUCTOR MFG4 citations60
US7262067B2Aug 28, 2007
Method for conductive film quality evaluation
TAIWAN SEMICONDUCTOR MFG1 citations51