P

Inventor

CHEN CHUNWEI

US12 patents
⚠️ This page may combine multiple inventors who share the name “CHEN CHUNWEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AZ ELECTRONIC MATERIALS USA

3 patents
US7601482B2Oct 13, 2009

Negative photoresist compositions

AZ ELECTRONIC MATERIALS USA16 citations82
US7524606B2Apr 28, 2009

Nanocomposite photoresist composition for imaging thick films

AZ ELECTRONIC MATERIALS USA2 citations61
US7247419B2Jul 24, 2007

Nanocomposite photosensitive composition and use thereof

AZ ELECTRONIC MATERIALS USA2 citations61

MERCK PATENT GMBH

3 patents
US11822242B2Nov 21, 2023

DNQ-type photoresist composition including alkali-soluble acrylic resins

MERCK PATENT GMBH0 citations51
US12393115B2Aug 19, 2025

Positive working photosensitive material

MERCK PATENT GMBH0 citations50
US11698586B2Jul 11, 2023

Negative-working ultra thick film photoresist

MERCK PATENT GMBH0 citations47

CHEN CHUNWEI

1 patent
US8906594B2Dec 9, 2014

Negative-working thick film photoresist

CHEN CHUNWEI7 citations76

OSNEXUS CORP

1 patent
US10013306B2Jul 3, 2018

Data recovery agent and search service for repairing bit rot

OSNEXUS CORP11 citations74

LIU WEIHONG

1 patent
US9012126B2Apr 21, 2015

Positive photosensitive material

LIU WEIHONG5 citations68

AZ ELECTRONIC MAT LUXEMBOURG SARL

1 patent
US10976662B2Apr 13, 2021

Positive working photosensitive material

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations58

ORMET CIRCUITS INC

1 patent
US12388004B2Aug 12, 2025

Lithographically defined electrical interconnects from conductive pastes

ORMET CIRCUITS INC0 citations49

AZ ELECTRONIC MAT LUXEMBOURG S AR L

1 patent
US10705424B2Jul 7, 2020

Negative-working photoresist compositions for laser ablation and use thereof

AZ ELECTRONIC MAT LUXEMBOURG S AR L0 citations33