P

Inventor

TACHIBANA MITSUHIRO

JP33 patents
⚠️ This page may combine multiple inventors who share the name “TACHIBANA MITSUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

20 patents
US9991138B2Jun 5, 2018

Etching method and etching apparatus

TOKYO ELECTRON LTD337 citations98
US6399484B1Jun 4, 2002

Semiconductor device fabricating method and system for carrying out the same

TOKYO ELECTRON LTD88 citations97
US6036782AMar 14, 2000

Shower head

TOKYO ELECTRON LTD109 citations97
US5997651ADec 7, 1999

Heat treatment apparatus

TOKYO ELECTRON LTD68 citations96
US5303671AApr 19, 1994

System for continuously washing and film-forming a semiconductor wafer

TOKYO ELECTRON LTD107 citations96
US6465347B2Oct 15, 2002

Tungsten film forming method

TOKYO ELECTRON LTD53 citations94
US6913996B2Jul 5, 2005

Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiring

TOKYO ELECTRON LTD20 citations92
US5972114AOct 26, 1999

Film deposition apparatus with anti-adhesion film and chamber cooling means

TOKYO ELECTRON LTD32 citations92
US9111747B2Aug 18, 2015

Film deposition apparatus, substrate processing apparatus and film deposition method

TOKYO ELECTRON LTD15 citations84
US6660101B1Dec 9, 2003

Method and apparatus for cleaning film deposition device

TOKYO ELECTRON LTD11 citations74
US9583312B2Feb 28, 2017

Film formation device, substrate processing device, and film formation method

TOKYO ELECTRON LTD5 citations73
US6346425B1Feb 12, 2002

Vapor-phase processing method capable of eliminating particle formation

TOKYO ELECTRON LTD8 citations72
US10903083B2Jan 26, 2021

Substrate processing method, substrate processing apparatus and substrate processing system

TOKYO ELECTRON LTD2 citations71
US6331483B1Dec 18, 2001

Method of film-forming of tungsten

TOKYO ELECTRON LTD13 citations71
US10460946B2Oct 29, 2019

Naturally oxidized film removing method and naturally oxidized film removing device

TOKYO ELECTRON LTD1 citations62
US7063871B2Jun 20, 2006

CVD process capable of reducing incubation time

TOKYO ELECTRON LTD4 citations62
US12237173B2Feb 25, 2025

Substrate processing method, substrate processing apparatus and substrate processing system

TOKYO ELECTRON LTD0 citations61
US8895456B2Nov 25, 2014

Method of depositing a film

TOKYO ELECTRON LTD2 citations61
US12283489B2Apr 22, 2025

Etching method and etching apparatus

TOKYO ELECTRON LTD0 citations60
US7592256B2Sep 22, 2009

Method of forming tungsten film

TOKYO ELECTRON LTD1 citations51

HITACHI SOFTWARE ENG

9 patents

IBM

1 patent

NEC ELECTRONICS CORP

1 patent

ENOMOTO TADASHI

1 patent

RAILWAY TECHNICAL RES INST

1 patent