Inventor
HAN WOO-SUNG
KR29 patents
⚠️ This page may combine multiple inventors who share the name “HAN WOO-SUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
22 patentsUS5725973AMar 10, 1998
Photo mask and method for manufacturing same
SAMSUNG ELECTRONICS CO LTD76 citations95
US5446587AAug 29, 1995
Projection method and projection system and mask therefor
SAMSUNG ELECTRONICS CO LTD63 citations95
US5547788AAug 20, 1996
Mask and method for manufacturing the same
SAMSUNG ELECTRONICS CO LTD26 citations92
US5413898AMay 9, 1995
Method of forming a pattern on a substrate having a step change in height
SAMSUNG ELECTRONICS CO LTD26 citations92
US5134058AJul 28, 1992
Method for forming a fine pattern on a semiconductor having a step therein
SAMSUNG ELECTRONICS CO LTD32 citations92
US5585210ADec 17, 1996
Mask pattern of a semiconductor device and a method of manufacturing fine patterns using the same
SAMSUNG ELECTRONICS CO LTD51 citations89
US6835507B2Dec 28, 2004
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
SAMSUNG ELECTRONICS CO LTD19 citations82
US5501581AMar 26, 1996
Magnetic fluid pump and a method for transporting fluid using the same
SAMSUNG ELECTRONICS CO LTD13 citations74
US5155367AOct 13, 1992
Gas contamination-measuring apparatus for use with an ultraviolet-emitting laser source
SAMSUNG ELECTRONICS CO LTD7 citations74
US5726738AMar 10, 1998
Aperture for off-axis illumination and projection exposure apparatus employing the same
SAMSUNG ELECTRONICS CO LTD9 citations73
US5978138ANov 2, 1999
Projection exposure systems
SAMSUNG ELECTRONICS CO LTD8 citations72
US5808796ASep 15, 1998
Projection method and projection system and mask therefor
SAMSUNG ELECTRONICS CO LTD8 citations72
US5661601AAug 26, 1997
Projection method and projection system and mask therefor
SAMSUNG ELECTRONICS CO LTD8 citations72
US5608576AMar 4, 1997
Projection method and projection system and mask therefor
SAMSUNG ELECTRONICS CO LTD7 citations72
US7172974B2Feb 6, 2007
Methods for forming fine pattern of semiconductor device
SAMSUNG ELECTRONICS CO LTD6 citations63
US7122478B2Oct 17, 2006
Method of manufacturing a semiconductor device using a polysilicon etching mask
SAMSUNG ELECTRONICS CO LTD4 citations63
US7375390B2May 20, 2008
Semiconductor memory device having high electrical performance and mask and photolithography friendliness
SAMSUNG ELECTRONICS CO LTD3 citations62
US7309683B2Dec 18, 2007
Cleaning composition and method of cleaning a semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US7176512B2Feb 13, 2007
Semiconductor memory device having high electrical performance and mask and photolithography friendliness
SAMSUNG ELECTRONICS CO LTD4 citations62
US7393615B2Jul 1, 2008
Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare
SAMSUNG ELECTRONICS CO LTD2 citations60
US6835529B2Dec 28, 2004
Polymer having butadiene sulfone repeating unit and resist composition comprising the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US7745068B2Jun 29, 2010
Binary photomask having a compensation layer
SAMSUNG ELECTRONICS CO LTD1 citations49