P

Inventor

KORZENSKI MICHAEL B

US30 patents
⚠️ This page may combine multiple inventors who share the name “KORZENSKI MICHAEL B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED TECH MATERIALS

16 patents
US7960328B2Jun 14, 2011

Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon

ADVANCED TECH MATERIALS53 citations97
US7922824B2Apr 12, 2011

Oxidizing aqueous cleaner for the removal of post-etch residues

ADVANCED TECH MATERIALS57 citations97
US7119418B2Oct 10, 2006

Supercritical fluid-assisted deposition of materials on semiconductor substrates

ADVANCED TECH MATERIALS31 citations93
US6735978B1May 18, 2004

Treatment of supercritical fluid utilized in semiconductor manufacturing applications

ADVANCED TECH MATERIALS31 citations93
US7223352B2May 29, 2007

Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal

ADVANCED TECH MATERIALS26 citations92
US7160815B2Jan 9, 2007

Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations

ADVANCED TECH MATERIALS28 citations92
US7119052B2Oct 10, 2006

Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers

ADVANCED TECH MATERIALS46 citations92
US6989358B2Jan 24, 2006

Supercritical carbon dioxide/chemical formulation for removal of photoresists

ADVANCED TECH MATERIALS20 citations92
US6943139B2Sep 13, 2005

Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations

ADVANCED TECH MATERIALS24 citations92
US8026200B2Sep 27, 2011

Low pH mixtures for the removal of high density implanted resist

ADVANCED TECH MATERIALS19 citations91
US9649712B2May 16, 2017

Apparatus and method for stripping solder metals during the recycling of waste electrical and electronic equipment

ADVANCED TECH MATERIALS6 citations84
US7557073B2Jul 7, 2009

Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist

ADVANCED TECH MATERIALS14 citations84
US7553803B2Jun 30, 2009

Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions

ADVANCED TECH MATERIALS19 citations84
US7517809B2Apr 14, 2009

Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations

ADVANCED TECH MATERIALS5 citations63
US9443713B2Sep 13, 2016

Oxidizing aqueous cleaner for the removal of post-etch residues

ADVANCED TECH MATERIALS2 citations62
US9158203B2Oct 13, 2015

Compositions and methods for the selective removal of silicon nitride

ADVANCED TECH MATERIALS2 citations59

ENTEGRIS INC

3 patents

CHEN TIANNIU

2 patents

RATH MELISSA K

2 patents

VISINTIN PAMELA M

2 patents

BROSSEAU André

1 patent

COOPER EMANUEL I

1 patent

MINSEK DAVID W

1 patent

KORZENSKI MICHAEL B

1 patent

POE SARAH L

1 patent