Inventor

YIN GERALD

US26 patents

⚠️ This page may combine multiple inventors who share the name “YIN GERALD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YIN GERALD

APPLIED MATERIALS INC

Integrated low K dielectrics and etch stops

Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners

Integrated low K dielectrics and etch stops

High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process

Plasma reactor with heated source of a polymer-hardening precursor material

Plasma assisted processing chamber with separate control of species density

Method and apparatus for altering magnetic coil current to produce etch uniformity in a magnetic field-enhanced plasma reactor

Integrated low k dielectrics and etch stops

Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma

Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners

RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

Integrated low k dielectrics and etch stops

Etched patterned copper features free from etch process residue

Patterned copper etch for micron and submicron features, using enhanced physical bombardment

Plasma reactor with heated source of a polymer-hardening precursor material

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

ADVANCED MICRO FAB EQUIP INC

Gas distribution assembly for use in a semiconductor work piece processing reactor

Multiple frequency plasma chamber, switchable RF system, and processes using same

Multi-station decoupled reactive ion etch chamber

CHEN AIHUA

Multi-station plasma reactor with multiple plasma regions

Method and apparatus for processing semiconductor work pieces

YIN GERALD

Capacitive CVD reactor and methods for plasma CVD process

Multi-station decoupled reactive ion etch chamber

LAM RES CORP

Method of producing flat ecr layer in microwave plasma device and apparatus therefor

INTEL CORP

Plasma etching process for MOS circuit pregate etching utiliizing a multi-step power reduction recipe