Inventor

KIM YUNSANG

US56 patents

⚠️ This page may combine multiple inventors who share the name “KIM YUNSANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KIM YUNSANG

LAM RES CORP

Bevel etcher with gap control

Back side deposition apparatus and applications

Configurable bevel etcher

Apparatus for the removal of an edge polymer from a substrate and methods therefor

Apparatus and methods to remove films on bevel edge and backside of wafer

Low-k damage avoidance during bevel etch processing

Methods for processing bevel edge etching

System, method and apparatus for self-cleaning dry etch

Methods and systems for a stress-free cleaning a surface of a substrate

Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter

Methods for controlling bevel edge etching in a plasma chamber

Plasma assisted doping on germanium

Plasma assisted doping on germanium

Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof

Rare earth metal surface-activated plasma doping on semiconductor substrates

Plasma processing chamber for bevel edge processing

Plasma processing chamber for bevel edge processing

Lower plasma-exclusion-zone rings for a bevel etcher

Upper plasma-exclusion-zone rings for a bevel etcher

Edge exclusion control with adjustable plasma exclusion zone ring

APPLIED MATERIALS INC

Integrated low K dielectrics and etch stops

Apparatus for uniformly etching a dielectric layer

Integrated low K dielectrics and etch stops

Etch method using a dielectric etch chamber with expanded process window

Integrated low k dielectrics and etch stops

Integrated low k dielectrics and etch stops

Method of forming a low-K dual damascene interconnect structure

Method of forming a low-K dual damascene interconnect structure

Selective etching of carbon-doped low-k dielectrics

Method of etching a trench in a silicon-containing dielectric material

Optical marker layer for etch endpoint determination

BAILEY III ANDREW D

Configurable bevel etcher

Bevel plasma treatment to enhance wet edge clean

Plasma processing chamber for bevel edge processing

Methods of and apparatus for protecting a region of process exclusion adjacent to a region of process performance in a process chamber

System, method and apparatus for self-cleaning dry etch

KIM YUNSANG

Bevel clean device

Methods to remove films on bevel edge and backside of wafer and apparatus thereof

Low-K damage avoidance during bevel etch processing

FANG TONG

Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter

Gas modulation to control edge exclusion in a bevel edge etching plasma chamber

LG DISPLAY CO LTD

Display device including a light guide plate with protrusions

Display device having a private mode and a sharing mode

APPLLIED MATERIALS INC

Plasma pretreatment of photoresist in an oxide etch process

CHEN JACK

Method and apparatus for processing bevel edge

SWAMI GANAPATHY

Methods for preventing corrosion of plasma-exposed yttria-coated constituents

SEXTON GREGORY S

Edge electrodes with dielectric covers

YOON HYUNGSUK ALEXANDER

Methods for removing an edge polymer from a substrate

KIM KEECHAN

Method and apparatus for detecting plasma unconfinement

SHIN NEUNGHO

Methods for depositing bevel protective film