Inventor · disambiguated record
Siegfried Maurer
Also filed as: MAURER SIEGFRIED · MAURER SIEGFRIED L · MAURER SIEGFRIED LUTZ
17 granted patents·4 pending applications·211 citations·filing 1981–2017
93Inventor score
Top patents by PatentIndex Score
21 records- 0196US8178430B2N-type carrier enhancement in semiconductorsKIM JEE HWAN·Filed 2009·Granted May 15, 2012·115 cites·9 claims
- 0295US8354694B2CMOS transistors with stressed high mobility channelsIBM·Filed 2010·Granted Jan 15, 2013·32 cites·25 claims
- 0385US9620592B2Doped zinc oxide and n-doping to reduce junction leakageIBM·Filed 2015·Granted Apr 11, 2017·4 cites·20 claims
- 0485US9443957B1Self-aligned source and drain regions for semiconductor devicesIBM·Filed 2015·Granted Sep 13, 2016·3 cites·17 claims
- 0583US9786756B2Self-aligned source and drain regions for semiconductor devicesIBM·Filed 2016·Granted Oct 10, 2017·2 cites·5 claims
- 0675US8343863B2N-type carrier enhancement in semiconductorsIBM·Filed 2012·Granted Jan 1, 2013·2 cites·2 claims
- 0772US8900730B2Method of fabricating graded mediaBHATIA CHARANJIT SINGH·Filed 2012·Granted Dec 2, 2014·4 cites·10 claims
- 0871US4344358AProcessing chamber, in particular smoking chamberMAURER SIEGFRIED·Filed 1981·Granted Aug 17, 1982·31 cites·12 claims
- 0961US9916984B2Self-aligned source and drain regions for semiconductor devicesIBM·Filed 2017·Granted Mar 13, 2018·0 cites·20 claims
- 1061US7718231B2Thin buried oxides by low-dose oxygen implantation into modified siliconIBM·Filed 2003·Granted May 18, 2010·8 cites·9 claims
- 1161US6784072B2Control of buried oxide in SIMOXIBM·Filed 2002·Granted Aug 31, 2004·9 cites·17 claims
- 1259US9673290B2Self-aligned source and drain regions for semiconductor devicesIBM·Filed 2016·Granted Jun 6, 2017·0 cites·16 claims
- 1354US9418692B2Method of fabricating graded mediaIBM·Filed 2014·Granted Aug 16, 2016·0 cites·10 claims
- 1454US8247319B1Method to enable the process and enlarge the process window for silicide, germanide or germanosilicide formation in structures with extremely small dimensionsFLETCHER BENJAMIN LUKE·Filed 2011·Granted Aug 21, 2012·1 cites·16 claims
- 1553US8642431B2N-type carrier enhancement in semiconductorsKIM JEE HWAN·Filed 2012·Granted Feb 4, 2014·0 cites·2 claims
- 1653US8476152B2N-type carrier enhancement in semiconductorsKIM JEE HWAN·Filed 2012·Granted Jul 2, 2013·0 cites·3 claims
- 1741US7492008B2Control of buried oxide in SIMOXIBM·Filed 2004·Granted Feb 17, 2009·0 cites·10 claims
- 1838US2005170570A1High electrical quality buried oxide in simoxIBM·Filed 2004·Application pending·0 cites
- 1937US2004266129A1Method of forming silicon-on-insulator wafers having process resistant applicationsIBM·Filed 2003·Application pending·0 cites
- 2037US2011241115A1Schottky Junction Source/Drain FET Fabrication Using Sulfur or Flourine Co-ImplantationIBM·Filed 2010·Application pending·0 cites
- 2136US2002190318A1Divot reduction in SIMOX layersIBM·Filed 2001·Application pending·0 cites
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