Inventor
SCHADT III FRANK LEONARD
US21 patents
⚠️ This page may combine multiple inventors who share the name “SCHADT III FRANK LEONARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
DU PONT
16 patentsUS6790587B1Sep 14, 2004
Fluorinated polymers, photoresists and processes for microlithography
DU PONT141 citations99
US6872503B2Mar 29, 2005
Copolymers for photoresists and processes therefor
DU PONT74 citations96
US6218074B1Apr 17, 2001
Flexible, flame-retardant, aqueous-processable photoimageable composition for coating flexible printed circuits
DU PONT102 citations96
US6884562B1Apr 26, 2005
Photoresists and processes for microlithography
DU PONT36 citations92
US5728505AMar 17, 1998
Flexible, aqueous processable, photoimageable permanent coatings for printed circuits
DU PONT30 citations91
US5643657AJul 1, 1997
Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
DU PONT27 citations91
US7261993B2Aug 28, 2007
Photoresists and processes for microlithography
DU PONT12 citations84
US7217495B2May 15, 2007
Fluorinated polymers, photoresists and processes for microlithography
DU PONT10 citations84
US6875555B1Apr 5, 2005
Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes)
DU PONT15 citations84
US6974657B2Dec 13, 2005
Compositions for microlithography
DU PONT10 citations72
US7834113B2Nov 16, 2010
Photoresist compositions and processes for preparing the same
DU PONT4 citations63
US7834209B2Nov 16, 2010
Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
DU PONT2 citations62
US6951705B2Oct 4, 2005
Polymers for photoresist compositions for microlithography
DU PONT2 citations56
US7022457B2Apr 4, 2006
Photoresists with hydroxylated, photoacid-cleavable groups
DU PONT1 citations52
US8048604B2Nov 1, 2011
Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
DU PONT0 citations51
US7507522B2Mar 24, 2009
Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
DU PONT0 citations50
COMMW SCIENT IND RES ORG
2 patentsUS7696292B2Apr 13, 2010
Low-polydispersity photoimageable acrylic polymers, photoresists and processes for microlithography
COMMW SCIENT IND RES ORG3 citations63
US7408013B2Aug 5, 2008
Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
COMMW SCIENT IND RES ORG1 citations52