Inventor
HILL CHRISTOPHER W
US21 patents
⚠️ This page may combine multiple inventors who share the name “HILL CHRISTOPHER W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
20 patentsUS6198144B1Mar 6, 2001
Passivation of sidewalls of a word line stack
MICRON TECHNOLOGY INC97 citations98
US7271050B2Sep 18, 2007
Silicon nanocrystal capacitor and process for forming same
MICRON TECHNOLOGY INC35 citations92
US6617230B2Sep 9, 2003
Use of selective ozone teos oxide to create variable thickness layers and spacers
MICRON TECHNOLOGY INC14 citations92
US6368986B1Apr 9, 2002
Use of selective ozone TEOS oxide to create variable thickness layers and spacers
MICRON TECHNOLOGY INC16 citations92
US5960303ASep 28, 1999
Process of forming titanium silicide interconnects
MICRON TECHNOLOGY INC22 citations92
US7846812B2Dec 7, 2010
Methods of forming trench isolation and methods of forming floating gate transistors
MICRON TECHNOLOGY INC8 citations84
US6372643B1Apr 16, 2002
Method for forming a selective contact and local interconnect in situ and semiconductor devices carrying the same
MICRON TECHNOLOGY INC4 citations74
US7214979B2May 8, 2007
Selectively deposited silicon oxide layers on a silicon substrate
MICRON TECHNOLOGY INC4 citations73
US6924969B2Aug 2, 2005
Silicon nanocrystal capacitor and process for forming same
MICRON TECHNOLOGY INC11 citations73
US6808983B2Oct 26, 2004
Silicon nanocrystal capacitor and process for forming same
MICRON TECHNOLOGY INC10 citations73
US6777351B1Aug 17, 2004
Masking without photolithography during the formation of a semiconductor device
MICRON TECHNOLOGY INC11 citations73
US6602807B2Aug 5, 2003
Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off
MICRON TECHNOLOGY INC9 citations73
US6503851B2Jan 7, 2003
Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off
MICRON TECHNOLOGY INC8 citations73
US7247561B2Jul 24, 2007
Method of removing residual contaminants from an environment
MICRON TECHNOLOGY INC3 citations63
US7192893B2Mar 20, 2007
Use of linear injectors to deposit uniform selective ozone TEOS oxide film by pulsing reactants on and off
MICRON TECHNOLOGY INC1 citations62
US7101814B2Sep 5, 2006
Masking without photolithography during the formation of a semiconductor device
MICRON TECHNOLOGY INC2 citations62
US7858518B2Dec 28, 2010
Method for forming a selective contact and local interconnect in situ
MICRON TECHNOLOGY INC1 citations52
US7737047B2Jun 15, 2010
Semiconductor constructions, and methods of forming dielectric materials
MICRON TECHNOLOGY INC1 citations52
US7611971B2Nov 3, 2009
Method of removing residual contaminants from an environment
MICRON TECHNOLOGY INC0 citations52
US7402533B2Jul 22, 2008
Masking without photolithography during the formation of a semiconductor device
MICRON TECHNOLOGY INC0 citations52