Inventor
OSADA YUKI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “OSADA YUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS7176634B2Feb 13, 2007
Coaxial type impedance matching device and impedance detecting method for plasma generation
TOKYO ELECTRON LTD115 citations98
US7355379B2Apr 8, 2008
Coaxial type impedance matching device and impedance detecting method for plasma generation
TOKYO ELECTRON LTD16 citations92
US9281154B2Mar 8, 2016
Microwave introducing mechanism, microwave plasma source and microwave plasma processing apparatus
TOKYO ELECTRON LTD15 citations84
US7445690B2Nov 4, 2008
Plasma processing apparatus
TOKYO ELECTRON LTD15 citations84
US7226524B2Jun 5, 2007
Plasma processing apparatus
TOKYO ELECTRON LTD12 citations82
US11152269B2Oct 19, 2021
Plasma processing apparatus and control method
TOKYO ELECTRON LTD2 citations73
US10971413B2Apr 6, 2021
Plasma processing apparatus and control method
TOKYO ELECTRON LTD4 citations73
US9520273B2Dec 13, 2016
Tuner, microwave plasma source and impedance matching method
TOKYO ELECTRON LTD5 citations73
US9520272B2Dec 13, 2016
Microwave emission mechanism, microwave plasma source and surface wave plasma processing apparatus
TOKYO ELECTRON LTD3 citations73
US9702913B2Jul 11, 2017
Acquisition method for S-parameters in microwave introduction modules, and malfunction detection method
TOKYO ELECTRON LTD2 citations72
US11244810B2Feb 8, 2022
Electric field sensor, surface wave plasma source, and surface wave plasma processing apparatus
TOKYO ELECTRON LTD2 citations70
US7915827B2Mar 29, 2011
Magnetron control method, magnetron service life judgment method, microwave generation device, magnetron service life judgment device, processing device, computer program, and storage medium
TOKYO ELECTRON LTD5 citations63
US12463013B2Nov 4, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12068208B2Aug 20, 2024
Plasma processing apparatus and control method
TOKYO ELECTRON LTD0 citations62
US10557200B2Feb 11, 2020
Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate
TOKYO ELECTRON LTD1 citations58
US12482637B2Nov 25, 2025
Plasma source and plasma processing apparatus
TOKYO ELECTRON LTD0 citations52
US9548187B2Jan 17, 2017
Microwave radiation antenna, microwave plasma source and plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US11569558B2Jan 31, 2023
Directional coupler for use in a substrate processing apparatus, where the directional coupler includes a coaxial line coupled to a conductor on a substrate
TOKYO ELECTRON LTD0 citations50
US11164730B2Nov 2, 2021
Plasma probe device and plasma processing apparatus
TOKYO ELECTRON LTD0 citations50
SUBARU CORP
3 patentsIKEDA TARO
2 patentsUS9072158B2Jun 30, 2015
Electromagnetic-radiation power-supply mechanism for exciting a coaxial waveguide by using first and second poles and a ring-shaped reflection portion
IKEDA TARO189 citations98
US8945342B2Feb 3, 2015
Surface wave plasma generating antenna and surface wave plasma processing apparatus
IKEDA TARO2 citations62