Inventor
IDA AYAKO
JP16 patents
⚠️ This page may combine multiple inventors who share the name “IDA AYAKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO CHEMICAL CO
9 patentsUS5792585AAug 11, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO7 citations73
US5736292AApr 7, 1998
Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
SUMITOMO CHEMICAL CO9 citations73
US5587492ADec 24, 1996
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO4 citations73
US5436107AJul 25, 1995
Positive resist composition
SUMITOMO CHEMICAL CO12 citations73
US5783355AJul 21, 1998
Radiation-sensitive positive resist composition
SUMITOMO CHEMICAL CO1 citations62
US5413895AMay 9, 1995
Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound.
SUMITOMO CHEMICAL CO4 citations62
US5368987ANov 29, 1994
Process for producing resist composition
SUMITOMO CHEMICAL CO2 citations60
US5360696ANov 1, 1994
Resist composition
SUMITOMO CHEMICAL CO2 citations60
US5714620AFeb 3, 1998
Polyhydric phenol compound and positive resist composition comprising the same
SUMITOMO CHEMICAL CO0 citations51