Inventor

HAFFNER HENNING

US40 patents

⚠️ This page may combine multiple inventors who share the name “HAFFNER HENNING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAFFNER HENNING

INFINEON TECHNOLOGIES AG

Semiconductor device fabrication using a photomask with assist features

Integrated circuits and methods of design and manufacture thereof

Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system

Generating mask layout data for simulation of lithographic processes

Semiconductor device fabrication using a photomask designed using modeling and empirical testing

Lithography masks and methods of manufacture thereof

Method for production of contacts on a wafer

Integrated circuits and methods of design and manufacture thereof

Optimized decoupling capacitor using lithographic dummy filler

Mask and method for patterning a semiconductor wafer

System and method for semiconductor device fabrication using modeling

Semiconductor mask and method of making same

Silicided semiconductor structure and method of forming the same

Integrated circuits and methods of design and manufacture thereof

Lithography masks and methods of manufacture thereof

Exposure mask with repaired dummy structure and method of repairing an exposure mask

Method for producing circuit structures on a semiconductor substrate and semiconductor configuration with functional circuit structures and dummy circuit structures

Method for communicating a measuring position of a structural element that is to be formed on a mask

Integrated circuits and methods of design and manufacture thereof

Integrated circuits and methods of design and manufacture thereof

Mask for projecting a structure pattern onto a semiconductor substrate

Method for dynamically monitoring a reticle

HAFFNER HENNING

Integrated circuits and methods of design and manufacture thereof

Integrated circuits and methods of design and manufacture thereof

Method for defining a separating structure within a semiconductor device

Method for defining a separating structure within a semiconductor device

L-shaped feature, method of making an L-shaped feature and method of making an L-shaped structure

Mask and method for patterning a semiconductor wafer

IBM

Dummy feature reduction using optical proximity effect correction

Generating cut mask for double-patterning process

Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs

MEEF reduction by elongation of square shapes

GUTMANN ALOIS

Lithography systems and methods of manufacturing using thereof

Lithography masks and methods of manufacture thereof

INFINEON TECHNOLOGIES CORP

Optimized decoupling capacitor using lithographic dummy filler

VISWANATHAN RAMYA

Calibration and verification structures for use in optical proximity correction

MEIRING JASON E

Methodology of placing printing assist feature for random mask layout

ADVANCED MASK TECHNOLOGY CT GMBH

Test pattern and method of evaluating the transfer properties of a test pattern

YAN JIANG

Silicided semiconductor structure and method of forming the same

BAUM ZACHARY

Mask layout formation