Inventor
NAKAGAWA HISASHI
JP28 patents
⚠️ This page may combine multiple inventors who share the name “NAKAGAWA HISASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
19 patentsUS7875317B2Jan 25, 2011
Composition for forming insulating film, method for producing same, silica-based insulating film, and method for forming same
JSR CORP7 citations84
US7528207B2May 5, 2009
Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
JSR CORP16 citations84
US11079676B2Aug 3, 2021
Radiation-sensitive composition, pattern-forming method, and metal-containing resin and production method thereof
JSR CORP8 citations83
US11506976B2Nov 22, 2022
Radiation-sensitive composition and resist pattern-forming method
JSR CORP2 citations72
US10018911B2Jul 10, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP4 citations72
US7736748B2Jun 15, 2010
Insulating-film-forming composition, method of producing the same, silica-based insulating film, and method of forming the same
JSR CORP2 citations62
US7358317B2Apr 15, 2008
Polycarbosilane and method of producing the same
JSR CORP2 citations62
US7893538B2Feb 22, 2011
Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device
JSR CORP3 citations60
US8017700B2Sep 13, 2011
Polycarbosilane, method for producing same, silica composition for coating application, and silica film
JSR CORP2 citations58
US9080065B2Jul 14, 2015
Composition for forming aluminum-containing film, and method for forming aluminum-containing film
JSR CORP0 citations52
US11204552B2Dec 21, 2021
Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agent
JSR CORP0 citations51
US9989849B2Jun 5, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP1 citations51
US10090163B2Oct 2, 2018
Inorganic film-forming composition for multilayer resist processes, and pattern-forming method
JSR CORP1 citations50
US9150962B2Oct 6, 2015
Method for producing substrate with metal body
JSR CORP0 citations50
US10209619B2Feb 19, 2019
Composition and method of forming pattern using composition
JSR CORP0 citations46
US10120282B2Nov 6, 2018
Chemically amplified resist material and resist pattern-forming method
JSR CORP0 citations41
US9939729B2Apr 10, 2018
Resist pattern-forming method
JSR CORP0 citations41
US10725376B2Jul 28, 2020
Pattern-forming method
JSR CORP0 citations40
US10520815B2Dec 31, 2019
Pattern-forming method
JSR CORP0 citations38
UNIV OSAKA
3 patentsUS10073349B2Sep 11, 2018
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
UNIV OSAKA2 citations62
US10073348B2Sep 11, 2018
Resist-pattern-forming method and chemically amplified resist material
UNIV OSAKA0 citations41
US9971247B2May 15, 2018
Pattern-forming method
UNIV OSAKA0 citations41
NAKAGAWA HISASHI
2 patentsAKIYAMA MASAHIRO
2 patentsUS8268403B2Sep 18, 2012
Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation
AKIYAMA MASAHIRO11 citations82
US8404786B2Mar 26, 2013
Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same
AKIYAMA MASAHIRO5 citations71