Inventor

GOEHNERMEIER AKSEL

DE33 patents

⚠️ This page may combine multiple inventors who share the name “GOEHNERMEIER AKSEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GOEHNERMEIER AKSEL

ZEISS CARL SMT GMBH

Projection exposure tool for microlithography and method for microlithographic imaging

Projection exposure tool for microlithography and method for microlithographic imaging

Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror

Projection exposure tool for microlithography and method for microlithographic imaging

Multilayer mirror

Method of structuring a photosensitive material

Projection exposure tool for microlithography and method for microlithographic imaging

Method of structuring a photosensitive material

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus

Projection exposure apparatus for EUV microlithography and method for microlithographic exposure

ZEISS CARL SMT AG

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Method of manufacturing a miniaturized device

Objective with crystal lenses

ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH

Method and measuring machine for determining dimensional properties of a measurement object

Coordinate measuring machine having an improved optical sensing system and related method

System and method for optical object coordinate determination

Probing element and coordinate measuring machine for measuring at least one measurement object

GOEHNERMEIER AKSEL

Projection exposure method and projection exposure system therefor

Projection exposure method and projection exposure system therefor

Projection objective for microlithography with stray light compensation and related methods

TOTZECK MICHAEL

Microlithographic projection exposure apparatus

Microlithographic projection exposure apparatus

HAUF MARKUS

Optical correction device

ZEISS CARL MICROSCOPY GMBH

Device for optical examination of a specimen, method for examining a specimen and method for transferring a device into an operation-ready state

ZEISS IND MESSTECHNIK GMBH

Measuring apparatus and method for determining dimensional characteristics of a measurement object

LOERING ULRICH

Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate

MUELLER RALF

Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror

GRUNER TORALF

Microlithographic exposure method as well as a projection exposure system for carrying out the method

SCHWAB MARKUS

Method of manufacturing a miniaturized device

LIMBACH GUIDO

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

PAZIDIS ALEXANDRA

Off-axis objectives with rotatable optical element