Inventor
RISPENS GIJSBERT
NL8 patents
Patents
8 patentsUS11079687B2Aug 3, 2021
Process window based on defect probability
ASML NETHERLANDS BV11 citations83
US10908496B2Feb 2, 2021
Membrane for EUV lithography
ASML NETHERLANDS BV3 citations70
US10416555B2Sep 17, 2019
Lithographic patterning process and resists to use therein
ASML NETHERLANDS BV3 citations70
US12474629B2Nov 18, 2025
Membrane for EUV lithography
ASML NETHERLANDS BV0 citations60
US11822255B2Nov 21, 2023
Process window based on defect probability
ASML NETHERLANDS BV0 citations60
US11762281B2Sep 19, 2023
Membrane for EUV lithography
ASML NETHERLANDS BV0 citations60
US11415886B2Aug 16, 2022
Lithographic patterning process and resists to use therein
ASML NETHERLANDS BV0 citations59
US10948825B2Mar 16, 2021
Method for removing photosensitive material on a substrate
ASML NETHERLANDS BV1 citations57