Inventor
CHEN LI-MIN
TW31 patents
⚠️ This page may combine multiple inventors who share the name “CHEN LI-MIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS11600521B2Mar 7, 2023
Surface modification layer for conductive feature formation
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations86
US10312106B2Jun 4, 2019
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10699944B2Jun 30, 2020
Surface modification layer for conductive feature formation
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10483108B2Nov 19, 2019
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US12046476B2Jul 23, 2024
Wet etching chemistry and method of forming semiconductor device using the same
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations68
US12347724B2Jul 1, 2025
Surface modification layer for conductive feature formation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11990339B2May 21, 2024
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11942362B2Mar 26, 2024
Surface modification layer for conductive feature formation
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11735426B2Aug 22, 2023
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11378882B2Jul 5, 2022
Chemical composition for tri-layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US11101135B2Aug 24, 2021
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11081350B2Aug 3, 2021
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12557577B2Feb 17, 2026
Method of forming semiconductor device using wet etching chemistry
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US12494432B2Dec 9, 2025
Semiconductor structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations55
US12165914B2Dec 10, 2024
Air spacer surrounding conductive features and method forming same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10867803B2Dec 15, 2020
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10761423B2Sep 1, 2020
Chemical composition for tri-layer removal
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10529572B2Jan 7, 2020
Semiconductor device and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
ENTEGRIS INC
5 patentsUS10138117B2Nov 27, 2018
Aqueous formulations for removing metal hard mask and post-etch residue with Cu/W compatibility
ENTEGRIS INC10 citations83
US10472567B2Nov 12, 2019
Compositions and methods for selectively etching titanium nitride
ENTEGRIS INC4 citations71
US10428271B2Oct 1, 2019
Compositions and methods for selectively etching titanium nitride
ENTEGRIS INC3 citations71
US10392560B2Aug 27, 2019
Compositions and methods for selectively etching titanium nitride
ENTEGRIS INC4 citations71
US9765288B2Sep 19, 2017
Compositions for cleaning III-V semiconductor materials and methods of using same
ENTEGRIS INC0 citations40