Inventor

TSAU HSUEH WEN

TW47 patents

⚠️ This page may combine multiple inventors who share the name “TSAU HSUEH WEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TSAU HSUEH WEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Structure and formation method of semiconductor device structure

Contact plug with impurity variation

Metal gate scheme for device and methods of forming

Metal gate scheme for device and methods of forming

Copper contact plugs with barrier layers

Pre-deposition treatment and atomic layer deposition (ALD) process and structures formed thereby

Pre-deposition treatment and atomic layer deposition (ALD) process and structures formed thereby

Semiconductor device structure

Low resistance fill metal layer material as stressor in metal gates

Semiconductor device structure and method for forming the same

Semiconductor arrangement and method of manufacture

Semiconductor device having a metal gate electrode stack

Gate replacement structures in semiconductor devices

Geometry for threshold voltage tuning on semiconductor device

Methods of gate replacement in semiconductor devices

Contact plug with impurity variation

Contact plug with impurity variation

Low resistance fill metal layer material as stressor in metal gates

Method of manufacturing a semiconductor device including capping layer, barrier layer and work function layer

Semiconductor device structure

Geometry for threshold voltage tuning on semiconductor device

Low resistance fill metal layer material as stressor in metal gates

Copper contact plugs with barrier layers

Semiconductor device having gate dielectric and inhibitor film over gate dielectric

Metal gate scheme for device and methods of forming

Geometry for threshold voltage tuning on semiconductor device

Method for forming semiconductor device structure

Tuning threshold voltage in field-effect transistors

Tuning threshold voltage in field-effect transistors

Tuning threshold voltage in field-effect transistors

Semiconductor device and method

Copper contact plugs with barrier layers

Semiconductor device having gate body and inhibitor film between conductive prelayer over gate body and conductive layer over inhibitor film

Fin field effect transistor (FinFET)

Semiconductor structure

Semiconductor device with sidewall passivation and method of making

Semiconductor structure and methods of forming the same

Method for fabricating a metal gate electrode

TAIWAN SEMICONDUCTOR MFG

Metal gate fill and method of making

Semiconductor device fabrication method and structure

Method of forming trench on FinFET and FinFET thereof

Method of manufacturing device having a blocking structure

TSAU HSUEH WEN

Semiconductor device having a metal gate electrode stack

Method of forming a metal gate

Method for fabricating a metal gate electrode

SU LI-LIN

Copper contact plugs with barrier layers

CHAN BOR-WEN

Semiconductor device having a blocking structure and method of manufacturing the same