P

Inventor

ZANG HUI

US405 patents
⚠️ This page may combine multiple inventors who share the name “ZANG HUI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GLOBALFOUNDRIES INC

36 patents
US10103238B1Oct 16, 2018

Nanosheet field-effect transistor with full dielectric isolation

GLOBALFOUNDRIES INC57 citations98
US9911736B1Mar 6, 2018

Method of forming field effect transistors with replacement metal gates and contacts and resulting structure

GLOBALFOUNDRIES INC86 citations97
US9276064B1Mar 1, 2016

Fabricating stacked nanowire, field-effect transistors

GLOBALFOUNDRIES INC68 citations97
US10269983B2Apr 23, 2019

Stacked nanosheet field-effect transistor with air gap spacers

GLOBALFOUNDRIES INC20 citations94
US10249538B1Apr 2, 2019

Method of forming vertical field effect transistors with different gate lengths and a resulting structure

GLOBALFOUNDRIES INC22 citations94
US10236215B1Mar 19, 2019

Methods of forming gate contact structures and cross-coupled contact structures for transistor devices

GLOBALFOUNDRIES INC22 citations94
US10217846B1Feb 26, 2019

Vertical field effect transistor formation with critical dimension control

GLOBALFOUNDRIES INC21 citations94
US10170473B1Jan 1, 2019

Forming long channel FinFET with short channel vertical FinFET and related integrated circuit

GLOBALFOUNDRIES INC20 citations94
US10163635B1Dec 25, 2018

Asymmetric spacer for preventing epitaxial merge between adjacent devices of a semiconductor and related method

GLOBALFOUNDRIES INC26 citations94
US10109637B1Oct 23, 2018

Cross couple structure for vertical transistors

GLOBALFOUNDRIES INC20 citations94
US10103247B1Oct 16, 2018

Vertical transistor having buried contact, and contacts using work function metals and silicides

GLOBALFOUNDRIES INC28 citations94
US9847391B1Dec 19, 2017

Stacked nanosheet field-effect transistor with diode isolation

GLOBALFOUNDRIES INC35 citations94
US9831346B1Nov 28, 2017

FinFETs with air-gap spacers and methods for forming the same

GLOBALFOUNDRIES INC33 citations94
US9324713B1Apr 26, 2016

Eliminating field oxide loss prior to FinFET source/drain epitaxial growth

GLOBALFOUNDRIES INC32 citations94
US9112032B1Aug 18, 2015

Methods of forming replacement gate structures on semiconductor devices

GLOBALFOUNDRIES INC29 citations94
US10236213B1Mar 19, 2019

Gate cut structure with liner spacer and related method

GLOBALFOUNDRIES INC25 citations93
US10134739B1Nov 20, 2018

Memory array with buried bitlines below vertical field effect transistors of memory cells and a method of forming the memory array

GLOBALFOUNDRIES INC21 citations93
US9960077B1May 1, 2018

Ultra-scale gate cut pillar with overlay immunity and method for producing the same

GLOBALFOUNDRIES INC24 citations93
US9935104B1Apr 3, 2018

Fin-type field effect transistors with single-diffusion breaks and method

GLOBALFOUNDRIES INC16 citations93
US9805982B1Oct 31, 2017

Apparatus and method of adjusting work-function metal thickness to provide variable threshold voltages in finFETs

GLOBALFOUNDRIES INC19 citations93
US9831317B1Nov 28, 2017

Buried contact structures for a vertical field-effect transistor

GLOBALFOUNDRIES INC18 citations92
US10410933B2Sep 10, 2019

Replacement metal gate patterning for nanosheet devices

GLOBALFOUNDRIES INC17 citations86
US10263122B1Apr 16, 2019

Methods, apparatus, and manufacturing system for self-aligned patterning of contacts in a vertical field effect transistor

GLOBALFOUNDRIES INC14 citations86
US10211206B1Feb 19, 2019

Two-port vertical SRAM circuit structure and method for producing the same

GLOBALFOUNDRIES INC17 citations86
US10164006B1Dec 25, 2018

LDMOS FinFET structures with trench isolation in the drain extension

GLOBALFOUNDRIES INC17 citations86
US10090169B1Oct 2, 2018

Methods of forming integrated circuit structures including opening filled with insulator in metal gate

GLOBALFOUNDRIES INC18 citations86
US10373877B1Aug 6, 2019

Methods of forming source/drain contact structures on integrated circuit products

GLOBALFOUNDRIES INC18 citations85
US10825741B2Nov 3, 2020

Methods of forming single diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products

GLOBALFOUNDRIES INC9 citations84
US10651284B2May 12, 2020

Methods of forming gate contact structures and cross-coupled contact structures for transistor devices

GLOBALFOUNDRIES INC7 citations84
US10566201B1Feb 18, 2020

Gate cut method after source/drain metallization

GLOBALFOUNDRIES INC6 citations84
US10475791B1Nov 12, 2019

Transistor fins with different thickness gate dielectric

GLOBALFOUNDRIES INC12 citations84
US10418285B1Sep 17, 2019

Fin field-effect transistor (FinFET) and method of production thereof

GLOBALFOUNDRIES INC8 citations84
US10373875B1Aug 6, 2019

Contacts formed with self-aligned cuts

GLOBALFOUNDRIES INC7 citations84
US10326002B1Jun 18, 2019

Self-aligned gate contact and cross-coupling contact formation

GLOBALFOUNDRIES INC11 citations84
US10283621B2May 7, 2019

Method of forming vertical field effect transistors with self-aligned gates and gate extensions and the resulting structure

GLOBALFOUNDRIES INC8 citations84
US10211315B2Feb 19, 2019

Vertical field-effect transistor having a dielectric spacer between a gate electrode edge and a self-aligned source/drain contact

GLOBALFOUNDRIES INC11 citations84

ZANG HUI

6 patents

SPRINT COMMUNICATIONS CO

5 patents

BOLOT JEAN

1 patent

OMNIVISION TECH INC

1 patent

FUTUREWEI TECHNOLOGIES INC

1 patent

Showing the top 50 of 405 patents by PatentIndex Score.