Inventor
MATSUI SHUN
JP37 patents
⚠️ This page may combine multiple inventors who share the name “MATSUI SHUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
23 patentsUS10424520B1Sep 24, 2019
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP15 citations85
US10685832B1Jun 16, 2020
Substrate processing apparatus
KOKUSAI ELECTRIC CORP3 citations72
US10651068B1May 12, 2020
Method of manufacturing semiconductor device by setting process chamber to maintenance enable state
KOKUSAI ELECTRIC CORP1 citations72
US10453720B1Oct 22, 2019
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP3 citations72
US12165894B2Dec 10, 2024
Processing method, method of manufacturing semiconductor, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US12093021B2Sep 17, 2024
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11891697B2Feb 6, 2024
Substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations62
US11747789B2Sep 5, 2023
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11749550B2Sep 5, 2023
Method of manufacturing semiconductor device by setting process chamber maintenance enable state
KOKUSAI ELECTRIC CORP0 citations62
US11355372B2Jun 7, 2022
Method of manufacturing semiconductor device by setting process chamber to maintenance enable state
KOKUSAI ELECTRIC CORP0 citations62
US11342212B2May 24, 2022
Method of manufacturing semiconductor device by setting process chamber maintenance enable state
KOKUSAI ELECTRIC CORP0 citations62
US11314234B2Apr 26, 2022
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US10978361B2Apr 13, 2021
Substrate processing apparatus and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US10978310B2Apr 13, 2021
Method of manufacturing semiconductor device and non-transitory computer-readable recording medium capable of adjusting substrate temperature
KOKUSAI ELECTRIC CORP0 citations62
US10930533B2Feb 23, 2021
Substrate processing apparatus, substrate processing system and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations62
US11289350B2Mar 29, 2022
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP1 citations61
US10984991B2Apr 20, 2021
Substrate processing apparatus
KOKUSAI ELECTRIC CORP1 citations61
US12567571B2Mar 3, 2026
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52
US10541170B2Jan 21, 2020
Substrate processing apparatus and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52
US12392032B2Aug 19, 2025
Substrate processing apparatus with cleaning of exhaust system
KOKUSAI ELECTRIC CORP0 citations51
US11422528B2Aug 23, 2022
Substrate processing system, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations51
US10503152B2Dec 10, 2019
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations42
US10714316B2Jul 14, 2020
Method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations41
HITACHI INT ELECTRIC INC
8 patentsUS9487863B2Nov 8, 2016
Substrate processing apparatus
HITACHI INT ELECTRIC INC8 citations84
US9431220B1Aug 30, 2016
Substrate processing apparatus and substrate processing system
HITACHI INT ELECTRIC INC10 citations84
US9171734B1Oct 27, 2015
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC8 citations84
US10934622B2Mar 2, 2021
Substrate processing apparatus
HITACHI INT ELECTRIC INC5 citations73
US9728431B2Aug 8, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC2 citations73
US10533250B2Jan 14, 2020
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations62
US10224227B2Mar 5, 2019
Method of processing substrate
HITACHI INT ELECTRIC INC0 citations52
US9735068B2Aug 15, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
CANON KK
6 patentsUS11343426B2May 24, 2022
Notifying apparatus, image capturing apparatus, notifying method, and storage medium for making a notification of motion blur
CANON KK0 citations62
US9402049B2Jul 26, 2016
Image processing apparatus and control method thereof
CANON KK1 citations52
US12457408B2Oct 28, 2025
Image processing apparatus, control method, and storage medium
CANON KK0 citations51
US11019254B2May 25, 2021
Image processing apparatus, control method for image processing apparatus, and storage medium having correction of effect of virtual light source
CANON KK0 citations51
US9661211B2May 23, 2017
Image capture apparatus and method for controlling the same
CANON KK0 citations42
US9569817B2Feb 14, 2017
Image processing apparatus, image processing method, and non-transitory computer readable storage medium
CANON KK0 citations41