Inventor
HAGIHARA MITSUO
JP8 patents
Patents
8 patentsUS6120969ASep 19, 2000
Polyphenol compound, quinonediazide ester and positive photoresist composition
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Nonaqueous secondary battery and method for manufacturing same
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US7666569B2Feb 23, 2010
Positive resist composition and method for forming resist pattern
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US7402372B2Jul 22, 2008
Positive resist composition and method of forming resist pattern
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US6730769B2May 4, 2004
Novolak resin, production process thereof and positive photoresist composition using the novolak resin
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US6630279B2Oct 7, 2003
Positive photoresist composition
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US9964851B2May 8, 2018
Resist pattern forming method and developer for lithography
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US6680155B2Jan 20, 2004
Positive photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations38