Inventor

PARK SOONAM

US80 patents

⚠️ This page may combine multiple inventors who share the name “PARK SOONAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PARK SOONAM

APPLIED MATERIALS INC

Radial waveguide systems and methods for post-match control of microwaves

Radial waveguide systems and methods for post-match control of microwaves

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved control

Systems and methods for internal surface conditioning in plasma processing equipment

Radial waveguide systems and methods for post-match control of microwaves

Radial waveguide systems and methods for post-match control of microwaves

Dry-etch selectivity

Semiconductor processing with DC assisted RF power for improved control

Chemical control features in wafer process equipment

Systems and methods for internal surface conditioning assessment in plasma processing equipment

Cobalt-containing material removal

High temperature chuck for plasma processing systems

Selective etch for metal-containing materials

Particle generation suppressor by DC bias modulation

Plasma-free metal etch

Selective etch for metal-containing materials

Chemical control features in wafer process equipment

Polarity control for remote plasma

Remote plasma source seasoning

Chemical control features in wafer process equipment

Dual discharge modes operation for remote plasma

Grooved insulator to reduce leakage current

Particle generation suppresor by DC bias modulation

Systems and methods for improved semiconductor etching and component protection

Particle generation suppresor by DC bias modulation

Optical emission spectroscopy (OES) for remote plasma monitoring

Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion

Plasma generation chamber with smooth plasma resistant coating

Gas baffle and distributor for semiconductor processing chamber

Gas baffle and distributor for semiconductor processing chamber

Low temperature chuck for plasma processing systems

Semiconductor substrate supports with embedded RF shield

Corrosion resistant ground shield of processing chamber

Cylindrical cavity with impedance shifting by irises in a power-supplying waveguide

Process chamber for cyclic and selective material removal and etching

Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide

Process chamber for cyclic and selective material removal and etching

Magnetic induction plasma source for semiconductor processes and equipment

Flow control features of CVD chambers

Optical emission spectroscopic techniques for monitoring etching

Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide

In-situ spatially resolved plasma monitoring by using optical emission spectroscopy

Semiconductor processing chamber for multiple precursor flow

Ceramic showerheads with conductive electrodes

Ceramic showerheads with conductive electrodes

Systems and methods for improved semiconductor etching and component protection

SAMSUNG ELECTRONICS CO LTD

Substrate processing apparatus

Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same

CHUC KIEN N

Flow control features of CVD chambers