P

Inventor

SHINOHARA KEISUKE

JP49 patents
⚠️ This page may combine multiple inventors who share the name “SHINOHARA KEISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HRL LAB LLC

23 patents
US8946724B1Feb 3, 2015

Monolithically integrated self-aligned GaN-HEMTs and Schottky diodes and method of fabricating the same

HRL LAB LLC37 citations94
US9142626B1Sep 22, 2015

Stepped field plate wide bandgap field-effect transistor and method

HRL LAB LLC18 citations92
US9954090B1Apr 24, 2018

Monolithic integration of group III nitride epitaxial layers

HRL LAB LLC8 citations84
US9929243B1Mar 27, 2018

Stepped field plate wide bandgap field-effect transistor and method

HRL LAB LLC4 citations84
US9515161B1Dec 6, 2016

Monolithically integrated self-aligned GaN-HEMTs and schottky diodes and method of fabricating the same

HRL LAB LLC8 citations84
US9449833B1Sep 20, 2016

Methods of fabricating self-aligned FETS using multiple sidewall spacers

HRL LAB LLC10 citations84
US10170611B1Jan 1, 2019

T-gate field effect transistor with non-linear channel layer and/or gate foot face

HRL LAB LLC16 citations83
US9530708B1Dec 27, 2016

Flexible electronic circuit and method for manufacturing same

HRL LAB LLC8 citations83
US9515068B1Dec 6, 2016

Monolithic integration of GaN and InP components

HRL LAB LLC12 citations83
US9419122B1Aug 16, 2016

Etch-based fabrication process for stepped field-plate wide-bandgap

HRL LAB LLC4 citations83
US9252247B1Feb 2, 2016

Apparatus and method for reducing the interface resistance in GaN Heterojunction FETs

HRL LAB LLC6 citations83
US9202880B1Dec 1, 2015

Etch-based fabrication process for stepped field-plate wide-bandgap

HRL LAB LLC10 citations83
US8980759B1Mar 17, 2015

Method of fabricating slanted field-plate GaN heterojunction field-effect transistor

HRL LAB LLC7 citations83
US10217648B1Feb 26, 2019

Fabrication of microfluidic channels in diamond

HRL LAB LLC8 citations81
US10192986B1Jan 29, 2019

HEMT GaN device with a non-uniform lateral two dimensional electron gas profile and method of manufacturing the same

HRL LAB LLC5 citations81
US10418473B1Sep 17, 2019

Monolithic integration of group III nitride epitaxial layers

HRL LAB LLC3 citations73
US10700201B2Jun 30, 2020

HEMT GaN device with a non-uniform lateral two dimensional electron gas profile and method of manufacturing the same

HRL LAB LLC2 citations72
US8698201B1Apr 15, 2014

Gate metallization methods for self-aligned sidewall gate GaN HEMT

HRL LAB LLC5 citations71
US9378949B1Jun 28, 2016

Monolithic integration of group III nitride epitaxial layers

HRL LAB LLC1 citations63
US8796736B1Aug 5, 2014

Monolithic integration of group III nitride epitaxial layers

HRL LAB LLC2 citations63
US10056340B1Aug 21, 2018

Flexible electronic circuit and method for manufacturing same

HRL LAB LLC0 citations51
US9691761B1Jun 27, 2017

Monolithic integration of GaN and InP components

HRL LAB LLC0 citations51
US9093394B1Jul 28, 2015

Method and structure for encapsulation and interconnection of transistors

HRL LAB LLC1 citations51

DOWA METALTECH CO LTD

8 patents

TELEDYNE SCIENT & IMAGING LLC

6 patents

MICOVIC MIROSLAV

2 patents

BROWN DAVID F

1 patent

SAITO ATSUSHI

1 patent

TEIJIN LTD

1 patent

CORRION ANDREA

1 patent

REGAN DEAN C

1 patent

KHALIL SAMEH G

1 patent

HRL LAB

1 patent

TOYOTA MOTOR CO LTD

1 patent

URTEAGA MIGUEL

1 patent

SHARIFI HASAN

1 patent