Inventor
MINAGAWA TOSHIKATSU
JP3 patents
Patents
3 patentsUS6143473ANov 7, 2000
Film patterning method utilizing post-development residue remover
FUJITSU LTD8 citations71
US6465137B2Oct 15, 2002
Resist composition and pattern forming process
FUJITSU LTD5 citations62
US6551749B1Apr 22, 2003
Developer and method for forming resist pattern and photomask produced by use thereof
FUJITSU LTD4 citations60