Inventor

KOO BON-WOONG

US79 patents

⚠️ This page may combine multiple inventors who share the name “KOO BON-WOONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOO BON-WOONG

VARIAN SEMICONDUCTOR EQUIPMENT

Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping

Ion beam uniformity control

Technique for monitoring and controlling a plasma process

Faraday dose and uniformity monitor for plasma based ion implantation

Apparatus and techniques for energetic neutral beam processing

Techniques for providing a multimode ion source

Techniques for providing a multimode ion source

Techniques for commensurate cusp-field for effective ion beam neutralization

Ion source and a method for in-situ cleaning thereof

Ion source cleaning method and apparatus

Technique for monitoring and controlling a plasma process

Technique for processing a substrate

Technique for processing a substrate

Monitoring plasma ion implantation systems for fault detection and process control

Techniques for detecting wafer charging in a plasma processing system

Method and system for plasma-assisted ion beam processing

Excited gas injection for ion implant control

Method of improving ion beam quality in an implant system

Method for implant productivity enhancement

Techniques for plasma injection

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

Dual cathode ion source

Temperature controlled ion source

RF ion source with dynamic volume control

High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

Boron implanting using a co-gas

Boron implanting using a co-gas

Method of improving ion beam quality in a non-mass-analyzed ion implantation system

Method of improving ion beam quality in a non-mass-analyzed ion implantation system

Dual cathode ion source

Boron implanting using a co-gas

Method of improving ion beam quality in an implant system

Dual cathode ion source

Ion beam quality control using a movable mass resolving device

APPLIED MATERIALS INC

Ion source with biased extraction plate

Ion source with single-slot tubular cathode

Ion source with tubular cathode

Variable thickness ion source extraction plate

Ion source with biased extraction plate

Single-slot tubular cathode

Ion source with single-slot tubular cathode

Particle yield via beam-line pressure control

KOO BON-WOONG

Biasing system for a plasma processing apparatus

Excited gas injection for ion implant control

Ion source and a method for in-situ cleaning thereof

BENVENISTE VICTOR

Temperature controlled ion source

Temperature controlled ion source

GODET LUDOVIC

Technique and apparatus for monitoring ion mass, energy, and angle in processing systems

SINCLAIR FRANK

Apparatus for controlling the temperature of an RF ion source window

CHO JEONG-HA

Unbalanced ion source

RADOVANOV SVETLANA B

Plasma potential modulated ion implantation system